C23C 14/352
Using more than one target
Official title: {using more than one target (C23C14/56 takes precedence)}
C23C14/352 (Using more than one target) appears on 584 US grants and 874 published applications in this corpus.
Search patents in C23C- Granted patents
- 584
- Published applications
- 874
- Assignees
- 424
- Inventors
- 1,888
- Latest grant
- 8 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 1 | 0 |
| 1979 | 1 | 0 |
| 1980 | 1 | 0 |
| 1981 | 1 | 0 |
| 1982 | 2 | 0 |
| 1983 | 2 | 0 |
| 1984 | 1 | 0 |
| 1985 | 1 | 0 |
| 1986 | 1 | 0 |
| 1987 | 1 | 0 |
| 1988 | 2 | 0 |
| 1989 | 4 | 0 |
| 1990 | 7 | 0 |
| 1991 | 1 | 0 |
| 1992 | 6 | 0 |
| 1993 | 4 | 0 |
| 1994 | 5 | 0 |
| 1995 | 0 | 0 |
| 1996 | 1 | 0 |
| 1997 | 5 | 0 |
| 1998 | 7 | 0 |
| 1999 | 4 | 0 |
| 2000 | 12 | 0 |
| 2001 | 13 | 8 |
| 2002 | 16 | 15 |
| 2003 | 14 | 15 |
| 2004 | 11 | 16 |
| 2005 | 12 | 27 |
| 2006 | 6 | 29 |
| 2007 | 4 | 34 |
| 2008 | 4 | 26 |
| 2009 | 9 | 46 |
| 2010 | 18 | 28 |
| 2011 | 6 | 22 |
| 2012 | 16 | 38 |
| 2013 | 20 | 47 |
| 2014 | 20 | 55 |
| 2015 | 23 | 38 |
| 2016 | 22 | 31 |
| 2017 | 32 | 37 |
| 2018 | 22 | 37 |
| 2019 | 22 | 39 |
| 2020 | 26 | 59 |
| 2021 | 27 | 43 |
| 2022 | 39 | 50 |
| 2023 | 43 | 49 |
| 2024 | 29 | 35 |
| 2025 | 41 | 33 |
| 2026 | 18 | 17 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Film forming method and film forming apparatus8 Sep 2026US 12,729,426 B2Tokyo Electron Limited
- PVD deposited ternary and quaternary NiTi alloys and methods of making same1 Sep 2026US 12,723,301 B2Vactronix Scientific, LLC
- Multicathode PVD system for high aspect ratio barrier seed deposition25 Aug 2026US 12,716,125 B2APPLIED Materials.Inc.
- Variable hardness nanocomposite coating18 Aug 2026US 12,709,794 B2Southwest Research Institute
- Magnetron sputtering apparatus and control method for timely detecting target shorting by monitoring electrical resistance between PVD target cathode and electrical ground in real time23 Jun 2026US 12,662,732 B2Arrayed Materials (China) Co., Ltd.
- Method for producing transparent conductive coatings for emi protection using hipims8 Oct 2026US 2026/0308745 A1Raytheon Company
- In situ and tunable deposition of a film1 Oct 2026US 2026/0297727 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Process for producing single crystal-like silver films10 Sep 2026US 2026/0265948 A1University of South-Eastern Norway
- Max-ag electrically conductive composite coating and preparation method thereof6 Aug 2026US 2026/0226606 A1Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences
- Hard film formed body, machine component, and bearing2 Jul 2026US 2026/0185562 A1Ntn Corporation
Most cited
By later US patents
- Apparatus and method for high throughput sputtering366US 5,683,561 AConner Peripherals, Inc. · 1997
- Magnetron sputtering apparatus and process326US 4,851,095 AOptical Coating Laboratory, Inc. · 1989
- Sputtering system using cylindrical rotating magnetron electrically powered using alternating current260US 5,814,195 AThe BOC Group, Inc. · 1998
- Sputtering of lithium229US 6,039,850 AMinnesota Mining and Manufacturing Company · 2000
- Thin-film solar cells205US 6,974,976 B2Miasole · 2005