C09K 13/04
Containing an inorganic acid
Official title: containing an inorganic acid
C09K13/04 (Containing an inorganic acid) appears on 842 US grants and 1,103 published applications in this corpus.
Search patents in C09K- Granted patents
- 842
- Published applications
- 1,103
- Assignees
- 365
- Inventors
- 2,232
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 2 | 0 |
| 1977 | 7 | 0 |
| 1978 | 2 | 0 |
| 1979 | 1 | 0 |
| 1980 | 0 | 0 |
| 1981 | 2 | 0 |
| 1982 | 1 | 0 |
| 1983 | 5 | 0 |
| 1984 | 2 | 0 |
| 1985 | 4 | 0 |
| 1986 | 4 | 0 |
| 1987 | 3 | 0 |
| 1988 | 6 | 0 |
| 1989 | 6 | 0 |
| 1990 | 5 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 1 | 0 |
| 1994 | 6 | 0 |
| 1995 | 0 | 0 |
| 1996 | 3 | 0 |
| 1997 | 3 | 0 |
| 1998 | 7 | 0 |
| 1999 | 12 | 0 |
| 2000 | 7 | 0 |
| 2001 | 16 | 8 |
| 2002 | 10 | 19 |
| 2003 | 11 | 16 |
| 2004 | 9 | 27 |
| 2005 | 9 | 19 |
| 2006 | 17 | 26 |
| 2007 | 12 | 23 |
| 2008 | 12 | 35 |
| 2009 | 11 | 19 |
| 2010 | 16 | 26 |
| 2011 | 16 | 16 |
| 2012 | 21 | 29 |
| 2013 | 21 | 41 |
| 2014 | 32 | 54 |
| 2015 | 49 | 63 |
| 2016 | 34 | 39 |
| 2017 | 34 | 33 |
| 2018 | 25 | 44 |
| 2019 | 45 | 67 |
| 2020 | 44 | 80 |
| 2021 | 64 | 77 |
| 2022 | 61 | 86 |
| 2023 | 38 | 66 |
| 2024 | 55 | 72 |
| 2025 | 49 | 73 |
| 2026 | 42 | 45 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Composition and method for treating substrate6 Oct 2026US 12,753,342 B2FUJIFILM Corporation
- Methods of forming an abrasive slurry and methods for chemical-mechanical polishing29 Sep 2026US 12,746,637 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Selective etching solution for 3D NAND structure sheet29 Sep 2026US 12,747,389 B2Hubei Sinophorus Electronic Materials Co., Ltd.
- Wet etching composition for etching a glass comprising hydrofluoric acid, oxalic acid, acetic acid, and a surfactant, wet etching method of a glass, and patterned glass by the wet etching method29 Sep 2026US 12,748,242 B2Power Support Co., Ltd.
- Compositions for polishing hardmasks and related systems and methods22 Sep 2026US 12,742,097 B2Entegris, Inc.
- Composition For TiN Hard Mask Removal While Compatible With Tungsten8 Oct 2026US 2026/0308449 A1Versum Materials US, LLC
- Composition for etching and method for manufacturing semiconductor device using same8 Oct 2026US 2026/0308450 A1Soulbrain Co., Ltd.
- Composition for wet etching and manufacturing method of semiconductor device using the composition8 Oct 2026US 2026/0314286 A1Samsung Electronics Co., Ltd.
- Method for etching polysilicon1 Oct 2026US 2026/0297425 A1Entegris, Inc.
- Polishing compositions and methods of use thereof24 Sep 2026US 2026/0286184 A1Fujifilm Electronic Materials U.S.A., Inc.
Most cited
By later US patents
- Methods of etching silicon nitride substantially selectively relative to an oxide of aluminum229US 7,030,034 B2Micron Technology, Inc. · 2006
- Conformal oxide dry etch186US 9,093,390 B2APPLIED Materials.Inc. · 2015
- Conformal oxide dry etch183US 8,801,952 B1APPLIED Materials.Inc. · 2014
- Etching techniques166US 4,498,953 AAT&T Bell Laboratories · 1985
- Chemical mechanical polishing composition and process142US 6,117,783 AEKC Technology, Inc. · 2000