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US 12,742,097 B2Granted
Compositions for polishing hardmasks and related systems and methods
AssigneeEntegris, Inc.
InventorsRajiv K. Singh, Aditya Dilip Verma, Sunny De
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Abstract
A system for polishing a hardmask comprises a composition comprising a permanganate ion of a permanganate oxidizer; a substrate comprising a hardmask that comprises at least one of a non-carbon boron component, a boron-carbon component, a non-carbon silicon component, a non-carbon chromium component, a non-carbon zirconium component, or any combination thereof; and a chemical mechanical planarization (CMP) apparatus configured to bring the composition and the substrate into contact so as to remove at least a portion of the hardmask of the substrate.
Claims3
A method comprising:
- obtaining a substrate comprising a hardmask formed of non-carbon material or boron-carbon material, wherein the hardmask comprises boron and amorphous silicon;
- obtaining a composition comprising a permanganate ion of a permanganate oxidizer, further comprising a metal-oxy catalyst comprising at least one of zirconium oxynitrate, zirconium oxychloride, nickel oxynitrate, nickel oxychloride, hafnium oxynitrate, hafnium oxychloride, zirconium oxy-alkanoates;
- and
- contacting the composition and the hardmask using a chemical mechanical planarization apparatus to remove at least a portion of the hardmask.
1 more element
Dependencies are inferred from the claim text.