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US 12,748,242 B2Granted
Wet etching composition for etching a glass comprising hydrofluoric acid, oxalic acid, acetic acid, and a surfactant, wet etching method of a glass, and patterned glass by the wet etching method
AssigneePower Support Co., Ltd.
InventorsSang-Ro Lee, Katsushi Igarashi
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Abstract
A wet etching method according to the present disclosure includes cleaning the glass, forming a nanoscale pattern by wet-etching the cleaned glass, and cleaning and drying the nano-patterned glass, wherein a wet etching solution used in the wet etching includes hydrofluoric acid and a surfactant. According to the present disclosure, a glass having high transmittance/low reflectance can be provided. The glass can be applied to an optical device and a display including a mobile device.
Claims13
A nano wet etching method of a glass, comprising:
- cleaning the glass;
- forming a nanoscale pattern by wet-etching the cleaned glass;
- and
- cleaning and drying the nano-patterned glass,
- wherein a wet etching solution used in the wet etching includes hydrofluoric acid, a surfactant, oxalic acid, and acetic acid,
- wherein the hydrofluoric acid is included in an amount of greater than 0 wt % and less than 5.0 wt %,
- wherein the oxalic acid is included in an amount of greater than 0 wt % and less than 5.0 wt %,
- wherein the acetic acid is included in an amount of greater than 0 wt % and less than 10.0 wt %, and
- wherein the surfactant is included in an amount of greater than 0 wt % and less than 1.0 wt %.
6 more elements
A wet etching solution composition for etching a glass, comprising:
- hydrofluoric acid in an amount of greater than 0 wt % and less than 5.0 wt %;
- oxalic acid in an amount of greater than 0 wt % and less than 5.0 wt %;
- acetic acid in an amount of greater than 0 wt % and less than 10.0 wt %;
- a surfactant in an amount of greater than 0 wt % and less than 1.0 wt %;
- and water as a remainder.
2 more elements
Dependencies are inferred from the claim text.