C09K 13/08
Containing a fluorine compound
Official title: containing a fluorine compound
C09K13/08 (Containing a fluorine compound) appears on 413 US grants and 545 published applications in this corpus.
Search patents in C09K- Granted patents
- 413
- Published applications
- 545
- Assignees
- 228
- Inventors
- 1,188
- Latest grant
- 29 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 2 | 0 |
| 1978 | 1 | 0 |
| 1979 | 1 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 3 | 0 |
| 1986 | 3 | 0 |
| 1987 | 2 | 0 |
| 1988 | 6 | 0 |
| 1989 | 3 | 0 |
| 1990 | 1 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 1 | 0 |
| 1994 | 2 | 0 |
| 1995 | 0 | 0 |
| 1996 | 2 | 0 |
| 1997 | 2 | 0 |
| 1998 | 4 | 0 |
| 1999 | 4 | 0 |
| 2000 | 2 | 0 |
| 2001 | 3 | 3 |
| 2002 | 6 | 12 |
| 2003 | 6 | 12 |
| 2004 | 7 | 22 |
| 2005 | 7 | 15 |
| 2006 | 12 | 18 |
| 2007 | 11 | 19 |
| 2008 | 8 | 18 |
| 2009 | 7 | 9 |
| 2010 | 11 | 15 |
| 2011 | 9 | 10 |
| 2012 | 10 | 18 |
| 2013 | 10 | 19 |
| 2014 | 21 | 20 |
| 2015 | 27 | 30 |
| 2016 | 11 | 21 |
| 2017 | 14 | 19 |
| 2018 | 17 | 23 |
| 2019 | 24 | 29 |
| 2020 | 22 | 24 |
| 2021 | 28 | 26 |
| 2022 | 26 | 35 |
| 2023 | 12 | 34 |
| 2024 | 22 | 25 |
| 2025 | 27 | 39 |
| 2026 | 15 | 30 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Wet etching composition for etching a glass comprising hydrofluoric acid, oxalic acid, acetic acid, and a surfactant, wet etching method of a glass, and patterned glass by the wet etching method29 Sep 2026US 12,748,242 B2Power Support Co., Ltd.
- Methods to improve etch uniformity across a semiconductor substrate when etching with a hydrofluoric acid (HF) and nitric acid (HNO3) solution1 Sep 2026US 12,727,411 B2Tokyo Electron Limited
- Semiconductor etching solution23 Jun 2026US 12,662,628 B2FUJIFILM Corporation
- Etchant composition and manufacturing method of display device using the same9 Jun 2026US 12,649,877 B2Samsung Display Co., Ltd.
- Microprocessing treatment agent and microprocessing treatment method26 May 2026US 12,637,615 B2Stella Chemifa Corporation
- Composition for wet etching and manufacturing method of semiconductor device using the composition8 Oct 2026US 2026/0314286 A1Samsung Electronics Co., Ltd.
- Etching solution and etching method24 Sep 2026US 2026/0286220 A1Tokyo Ohka Kogyo.Co., Ltd.
- Silicon nitride etching composition and method17 Sep 2026US 2026/0275191 A1Entegris, Inc.
- Etching method, etching apparatus, and method of manufacturing semiconductor device17 Sep 2026US 2026/0282784 A1
- Chemical solution, method for processing processing target, and method for producing semiconductor device27 Aug 2026US 2026/0250574 A1FUJIFILM Corporation
Most cited
By later US patents
- Methods of etching silicon nitride substantially selectively relative to an oxide of aluminum229US 7,030,034 B2Micron Technology, Inc. · 2006
- Conformal oxide dry etch186US 9,093,390 B2APPLIED Materials.Inc. · 2015
- Conformal oxide dry etch183US 8,801,952 B1APPLIED Materials.Inc. · 2014
- Etching techniques166US 4,498,953 AAT&T Bell Laboratories · 1985
- Silicon-germanium-carbon compositions in selective etch processes119US 5,906,708 ALawrence Semiconductor Research Laboratory, Inc. · 1999