B81C 2201/0135
Controlling etch progression
B81C2201/0135 (Controlling etch progression) appears on 430 US grants and 418 published applications in this corpus.
Search patents in B81C- Granted patents
- 430
- Published applications
- 418
- Assignees
- 210
- Inventors
- 917
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 1 | 0 |
| 1990 | 1 | 0 |
| 1991 | 1 | 0 |
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 1 | 0 |
| 1995 | 3 | 0 |
| 1996 | 3 | 0 |
| 1997 | 2 | 0 |
| 1998 | 9 | 0 |
| 1999 | 11 | 0 |
| 2000 | 11 | 0 |
| 2001 | 5 | 7 |
| 2002 | 14 | 15 |
| 2003 | 19 | 16 |
| 2004 | 13 | 18 |
| 2005 | 9 | 15 |
| 2006 | 11 | 17 |
| 2007 | 14 | 12 |
| 2008 | 11 | 17 |
| 2009 | 10 | 19 |
| 2010 | 17 | 14 |
| 2011 | 13 | 12 |
| 2012 | 9 | 12 |
| 2013 | 12 | 14 |
| 2014 | 21 | 20 |
| 2015 | 18 | 14 |
| 2016 | 16 | 27 |
| 2017 | 20 | 29 |
| 2018 | 25 | 21 |
| 2019 | 26 | 16 |
| 2020 | 22 | 14 |
| 2021 | 15 | 18 |
| 2022 | 11 | 10 |
| 2023 | 13 | 24 |
| 2024 | 13 | 16 |
| 2025 | 15 | 9 |
| 2026 | 12 | 12 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
- B81C 2201/014By depositing an etch stop layerIndexing code254
- B81C 2201/0136By doping limited material regionsIndexing code67
- B81C 2201/0142Processes for controlling etch progression not provided for in b81c2201/0136 - b81c2201/014Indexing code52
- B81C 2201/0138Monitoring physical parameters in the etching chamberIndexing code36
- B81C 2201/0139With the electric potential of an electrochemical etchingIndexing code13
Recent patents
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- Method for producing a microelectromechanical device comprising a cap structure and a microelectromechanical device8 Oct 2026US 2026/0307983 A1
- Method of manufacturing a microstructure6 Aug 2026US 2026/0225877 A1
- Method for manufacturing microstructures6 Aug 2026US 2026/0231708 A1Commissariat A L' Energie Atomique Et Aux Energies Alternatives
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Most cited
By later US patents
- Lithography device for semiconductor circuit pattern generator287US 7,242,012 B2Elm Technology Corporation · 2007
- Microfabricated filter with specially constructed channel walls, and containment well and capsule constructed with such filters171US 5,798,042 AThe Regents of the University of California · 1998
- Method and apparatus for monitoring processes using multiple parameters of a semiconductor wafer processing system122US 5,910,011 AAPPLIED Materials.Inc. · 1999
- Micromachined capsules having porous membranes and bulk supports115US 5,770,076 AThe Regents of the University of California · 1998
- Capacitive surface micromachined differential pressure sensor112US 5,332,469 AFord Motor Company · 1994