Method for producing a microelectromechanical device comprising a cap structure and a microelectromechanical device

A method for producing a microelectromechanical device which includes a functional unit, a cavity, and a cap structure that covers the cavity and has at least one cavity access, the method comprising:

• producing the cap structure by sequentially depositing layers of material onto a cap substrate;
• connecting the functional unit to the cap structure;
• and
• creating in the cap structure at least one inlet channel in the at least one cavity access by etching;
• wherein, during the production of the cap structure, at least one inlet channel, at least one outlet channel which opens into the cavity, and at least one lateral channel which extends parallel to a surface of the cap substrate and opens into the at least one inlet channel and into the at least one outlet channel are created in the cap structure;
• and
• during the production of the cap structure, a first etch stop structure is created in the cap structure to limit a depth of the inlet channel.

A microelectromechanical device, comprising:

• a functional unit;
• a cavity;
• and
• a cap structure that covers the cavity and has at least one cavity access;
• wherein the cavity access includes at least one inlet channel, at least one outlet channel which opens into the cavity, and at least one lateral channel which extends parallel to a surface of the cap substrate and opens into the at least one inlet channel and into the at least one outlet channel, and
• wherein the at least one inlet channel in the cap structure is limited in terms of its depth by a first etch stop structure.