Y10S 438/952
Utilizing antireflective layer
Y10S438/952 (Utilizing antireflective layer) appears on 264 US grants and 134 published applications in this corpus.
Search patents in Y10S- Granted patents
- 264
- Published applications
- 134
- Assignees
- 85
- Inventors
- 517
- Latest grant
- 18 Aug 2015
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 1 | 0 |
| 1988 | 2 | 0 |
| 1989 | 2 | 0 |
| 1990 | 3 | 0 |
| 1991 | 1 | 0 |
| 1992 | 2 | 0 |
| 1993 | 1 | 0 |
| 1994 | 2 | 0 |
| 1995 | 5 | 0 |
| 1996 | 6 | 0 |
| 1997 | 12 | 0 |
| 1998 | 9 | 0 |
| 1999 | 20 | 0 |
| 2000 | 20 | 0 |
| 2001 | 21 | 5 |
| 2002 | 15 | 11 |
| 2003 | 25 | 15 |
| 2004 | 14 | 11 |
| 2005 | 12 | 13 |
| 2006 | 12 | 13 |
| 2007 | 5 | 15 |
| 2008 | 10 | 24 |
| 2009 | 21 | 9 |
| 2010 | 15 | 10 |
| 2011 | 12 | 5 |
| 2012 | 6 | 1 |
| 2013 | 4 | 0 |
| 2014 | 1 | 1 |
| 2015 | 2 | 1 |
By publication year. Applications have been published since 2001.
Recent patents
- Anti-reflective coatings using vinyl ether crosslinkers18 Aug 2015US 9,110,372 B2Brewer Science Inc.
- Method of forming fine patterns of semiconductor device7 Apr 2015US 8,999,840 B2Samsung Electronics Co., Ltd.
- Material with tunable index of refraction2 Dec 2014US 8,900,897 B2Intermolecular, Inc.
- Composition for forming underlayer coating for litography containing epoxy compound and carboxylic acid compound11 Jun 2013US 8,460,855 B2Nissan Chemical Industries, Ltd.
- Hardmask composition having antireflective properties and method of patterning material on substrate using the same21 May 2013US 8,445,187 B2Cheil Industries Inc.
- Method of forming fine patterns of semiconductor device15 Jan 2015US 2015/0017808 A1Samsung Electronics Co., Ltd.
- Material with tunable index of refraction10 Jul 2014US 2014/0191262 A1Intermolecular, Inc.
- Anti-reflective coatings using vinyl ether crosslinkers21 Jun 2012US 2012/0156613 A1Brewer Science Inc.
- Self-Segregating Multilayer Imaging Stack With Built-In Antireflective Properties8 Dec 2011US 2011/0300483 A1International Business Machines Corporation
- Self-Segregating Multilayer Imaging Stack With Built-In Antireflective Properties1 Dec 2011US 2011/0294068 A1International Business Machines Corporation
Most cited
By later US patents
- Bilayer metallization cap for photolithography286US 5,219,788 AIBM Corporation · 1993
- Anti-reflective coating227US 4,910,122 ABrewer Science Inc. · 1990
- Methods and apparatus for etching semiconductor wafers226US 6,004,884 ALam Research Corporation · 1999
- Method for pitch reduction215US 6,638,441 B2Macronix International Co., Ltd. · 2003
- Method for forming a conductive layer117US 6,924,230 B2Industrial Technology Research Institute · 2005