Y10S 438/948
Radiation resist
Y10S438/948 (Radiation resist) appears on 1,063 US grants and 443 published applications in this corpus.
Search patents in Y10S- Granted patents
- 1,063
- Published applications
- 443
- Assignees
- 278
- Inventors
- 1,782
- Latest grant
- 1 Apr 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 6 | 0 |
| 1977 | 7 | 0 |
| 1978 | 6 | 0 |
| 1979 | 4 | 0 |
| 1980 | 6 | 0 |
| 1981 | 9 | 0 |
| 1982 | 9 | 0 |
| 1983 | 12 | 0 |
| 1984 | 13 | 0 |
| 1985 | 22 | 0 |
| 1986 | 21 | 0 |
| 1987 | 28 | 0 |
| 1988 | 17 | 0 |
| 1989 | 26 | 0 |
| 1990 | 34 | 0 |
| 1991 | 21 | 0 |
| 1992 | 20 | 0 |
| 1993 | 24 | 0 |
| 1994 | 25 | 0 |
| 1995 | 29 | 0 |
| 1996 | 45 | 0 |
| 1997 | 42 | 0 |
| 1998 | 33 | 0 |
| 1999 | 51 | 0 |
| 2000 | 44 | 0 |
| 2001 | 46 | 14 |
| 2002 | 34 | 41 |
| 2003 | 50 | 61 |
| 2004 | 53 | 47 |
| 2005 | 40 | 47 |
| 2006 | 43 | 40 |
| 2007 | 30 | 40 |
| 2008 | 30 | 46 |
| 2009 | 45 | 26 |
| 2010 | 38 | 26 |
| 2011 | 36 | 21 |
| 2012 | 28 | 9 |
| 2013 | 8 | 4 |
| 2014 | 5 | 4 |
| 2015 | 12 | 6 |
| 2016 | 2 | 2 |
| 2017 | 0 | 0 |
| 2018 | 2 | 2 |
| 2019 | 1 | 2 |
| 2020 | 3 | 1 |
| 2021 | 1 | 1 |
| 2022 | 0 | 0 |
| 2023 | 1 | 2 |
| 2024 | 0 | 0 |
| 2025 | 1 | 1 |
By publication year. Applications have been published since 2001.
Subgroups
Granted patents
Recent patents
- Method for forming patterned mask layer1 Apr 2025US 12,266,528 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Method for forming patterned mask layer11 Jul 2023US 11,699,589 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Alternating hardmasks for tight-pitch line formation9 Nov 2021US 11,171,002 B2Tessera, Inc.
- Semiconductor element and display device using the same1 Dec 2020US 10,854,642 B2Semiconductor Energy Laboratory Co.Ltd.
- Semiconductor element and display device using the same30 Jun 2020US 10,700,106 B2Semiconductor Energy Laboratory Co.Ltd.
- Method for forming patterned mask layer19 Jun 2025US 2025/0201562 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Method for forming patterned mask layer2 Nov 2023US 2023/0352303 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Method for forming patterned mask layer2 Feb 2023US 2023/0030767 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Semiconductor element and display device using the same1 Apr 2021US 2021/0098508 A1Semiconductor Energy Laboratory Co.Ltd.
- Alternating hardmasks for tight-pitch line formation20 Aug 2020US 2020/0266066 A1Tessera, Inc.
Most cited
By later US patents
- Method for integrated circuit fabrication using pitch multiplication457US 7,115,525 B2Micron Technology, Inc. · 2006
- Pattern definition in an organic layer359US 3,962,004 ARCA Corporation · 1976
- Method of making an adaptive configurable gate array305US 5,217,916 ATRW Inc. · 1993
- Lithography device for semiconductor circuit pattern generator287US 7,242,012 B2Elm Technology Corporation · 2007
- Bilayer metallization cap for photolithography286US 5,219,788 AIBM Corporation · 1993