Y10S 438/949
Energy beam treating radiation resist on semiconductor
Y10S438/949 (Energy beam treating radiation resist on semiconductor) appears on 231 US grants and 102 published applications in this corpus.
Search patents in Y10S- Granted patents
- 231
- Published applications
- 102
- Assignees
- 110
- Inventors
- 421
- Latest grant
- 7 Apr 2015
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1978 | 2 | 0 |
| 1979 | 2 | 0 |
| 1980 | 0 | 0 |
| 1981 | 2 | 0 |
| 1982 | 1 | 0 |
| 1983 | 3 | 0 |
| 1984 | 2 | 0 |
| 1985 | 1 | 0 |
| 1986 | 4 | 0 |
| 1987 | 9 | 0 |
| 1988 | 6 | 0 |
| 1989 | 7 | 0 |
| 1990 | 7 | 0 |
| 1991 | 4 | 0 |
| 1992 | 6 | 0 |
| 1993 | 10 | 0 |
| 1994 | 9 | 0 |
| 1995 | 6 | 0 |
| 1996 | 13 | 0 |
| 1997 | 8 | 0 |
| 1998 | 7 | 0 |
| 1999 | 6 | 0 |
| 2000 | 8 | 0 |
| 2001 | 7 | 3 |
| 2002 | 4 | 10 |
| 2003 | 11 | 21 |
| 2004 | 16 | 16 |
| 2005 | 14 | 13 |
| 2006 | 10 | 10 |
| 2007 | 12 | 4 |
| 2008 | 6 | 8 |
| 2009 | 6 | 6 |
| 2010 | 5 | 3 |
| 2011 | 7 | 4 |
| 2012 | 8 | 3 |
| 2013 | 1 | 0 |
| 2014 | 0 | 0 |
| 2015 | 1 | 1 |
By publication year. Applications have been published since 2001.
Recent patents
- Method of forming fine patterns of semiconductor device7 Apr 2015US 8,999,840 B2Samsung Electronics Co., Ltd.
- Direct write lithography system17 Dec 2013US 8,610,093 B2Mapper Lithography IP B.V.
- Patterning method for high density pillar structures11 Dec 2012US 8,329,512 B2SanDisk 3D LLC
- Method of manufacturing a semiconductor device4 Dec 2012US 8,324,032 B2Semiconductor Energy Laboratory Co.Ltd.
- Patterning method for high density pillar structures14 Aug 2012US 8,241,969 B2SanDisk 3D LLC
- Method of forming fine patterns of semiconductor device15 Jan 2015US 2015/0017808 A1Samsung Electronics Co., Ltd.
- Patterning Method for High Density Pillar Structures1 Nov 2012US 2012/0276744 A1SanDisk 3D LLC
- Direct write lithography system6 Sep 2012US 2012/0224155 A1Mapper Lithography IP B.V.
- Method of fabricating semiconductor device and fabrication system of semiconductor device5 Jan 2012US 2012/0003761 A1Samsung Electronics Co., Ltd.
- Patterning Method for High Density Pillar Structures15 Dec 2011US 2011/0306174 A1SanDisk 3D LLC
Most cited
By later US patents
- Method of making an adaptive configurable gate array305US 5,217,916 ATRW Inc. · 1993
- Lithography device for semiconductor circuit pattern generator287US 7,242,012 B2Elm Technology Corporation · 2007
- Method of making IGFETs in densely and sparsely populated areas of a substrate228US 5,789,300 AAdvanced Micro Devices, Inc. · 1998
- Ion beam exposure of (g-Ge.sub.x -Se.sub.1-x) inorganic resists196US 4,405,710 ACornell Research Foundation, Inc. · 1983
- Processes depending on plasma generation using a helical resonator178US 4,918,031 AAmerican Telephone and Telegraph Company, AT&T Bell Laboratories · 1990