Processes depending on plasma generation using a helical resonator
AssigneeAmerican Telephone and Telegraph Company, AT&T Bell Laboratories
InventorsDaniel L. Flamm, Dale E. Ibbotson, Wayne L. Johnson
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Abstract
Anisotropic plasma etching is accomplished utilizing a helical resonator operated at relatively low gas pressure. The use of this combination yields an extremely high flux of ionic species with resulting rapid anisotropic etching. A helical resonator in conjunction with suitable precursors is also quite useful for plasma induced deposition.
Claims38
A process for fabricating a device comprising the steps of subjecting a substrate to a composition comprising entities that induce anisotropic removal of material from said substrate and employing the resulting substrate for completion of said device, characterized in that said entity emanates from a species generated in a helical resonator wherein said species is from a discharge in a gas at a pressure less than about 10 mTorr
A process for fabricating a device comprising the steps of subjecting a substrate to a composition of entities and employing the resulting substrate for completion of said device, characterized in that said entity emanates from a species generated in a helical resonator wherein said species is from a discharge in a gas at a pressure less than about 10 mTorr.
A process for fabricating a device comprising the steps of subjecting a substrate to a composition comprising entities that induce deposition on said substrate and employ the resulting substrate for completion of said device, characterized in that said entity emanates from a species generated in a helical resonator wherein said substrate is within said resonator.
A process for fabricating a device comprising the steps of subjecting a substrate to a composition comprising entities and employing the resulting substrate for completion of said device, characterized in that said entity emanates from a species generated in a helical resonator wherein said resonator comprises a half wave, multiple half wave, or odd multiple quarter wave resonator.
A process for fabricating a device comprising the steps of subjecting a substrate to a composition comprising entities and employing the resulting substrate for completion of said device, characterized in that said entity emanates from a species generated in a helical resonator and said species interacts downstream with a second gas phase species.
A process for fabricating a device comprising the steps of subjecting a substrate to a composition comprising entities and employing the resulting substrate for completion of said device characterized in that said entity is at least in part generated due to a pulsing process in association with a helical resonator.
Dependencies are inferred from the claim text.