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US 2012/0156613 A1Published application
Anti-reflective coatings using vinyl ether crosslinkers
AssigneeBrewer Science Inc.
InventorsDouglas J. Guerrero, Robert Christian Cox, Marc W. Weimer
Life of this patent
Estimating the term…
Abstract
Novel, wet developable anti-reflective coating compositions and methods of using those compositions are provided. The compositions comprise a polymer and/or oligomer having acid functional groups and dissolved in a solvent system along with a crosslinker and a photoacid generator. The preferred acid functional group is a carboxylic acid, while the preferred crosslinker is a vinyl ether crosslinker. In use, the compositions are applied to a substrate and thermally crosslinked. Upon exposure to light, the cured compositions will decrosslink, rendering them soluble in typical photoresist developing solutions (e.g., alkaline developers).
Claims35
A method of forming a microelectronic structure, said method comprising the steps of:
- providing a substrate having a surface;
- applying a composition to said surface, said composition comprising:
- a compound selected from the group consisting of polymers, oligomers, and mixtures thereof, said compound comprising acid groups other than phenolic groups, and having protected acid groups and unprotected acid groups, wherein the molar ratio of protected acid groups to unprotected acid groups is from about 1:3 to about 3:1;
- a chromophore;
- a vinyl ether crosslinker;
- and
- a solvent system, said compound, chromophore, and crosslinker being dissolved or dispersed in said solvent system;
- and
- crosslinking the compound in said composition to yield a crosslinked composition having a k value of at least about 0.1 at the wavelength of use.
6 more elements
A microelectronic structure comprising:
- a substrate having a surface;
- and
- a crosslinked layer adjacent said substrate surface, said layer having a k value of at least about 0.1 at the wavelength of use and being formed from a composition comprising:
- a compound selected from the group consisting of polymers, oligomers, and mixtures thereof, said compound comprising acid groups other than phenolic groups, and having protected acid groups and unprotected acid groups, wherein the molar ratio of protected acid groups to unprotected acid groups is from about 1:3 to about 3:1;
- a chromophore;
- a vinyl ether crosslinker;
- and
- a solvent system, said compound, chromophore, and crosslinker being dissolved or dispersed in said solvent system.
5 more elements
A composition useful for forming microelectronic devices, said composition comprising:
- a compound selected from the group consisting of polymers, oligomers, and mixtures thereof, said compound comprising acid groups other than phenolic groups, and having protected acid groups and unprotected acid groups, wherein the molar ratio of protected acid groups to unprotected acid groups is from about 1:3 to about 3:1;
- from about 20 to about 40% by weight of a chromophore, based upon the total weight of the compound taken as 100% by weight;
- a vinyl ether crosslinker;
- and
- a solvent system, said compound, chromophore, and crosslinker being dissolved or dispersed in said solvent system,
- said composition being wet developable.
3 more elements
A method of forming a microelectronic structure, said method comprising the steps of:
- providing a substrate having a surface;
- applying a composition to said surface, said composition comprising:
- a compound selected from the group consisting of polymers, oligomers, and mixtures thereof, said compound comprising acid groups other than phenolic groups, and having protected acid groups and unprotected acid groups, wherein the molar ratio of protected acid groups to unprotected acid groups is from about 1:3 to about 3:1;
- a chromophore;
- a vinyl ether crosslinker;
- and
- a solvent system, said compound, chromophore, and crosslinker being dissolved or dispersed in said solvent system;
- crosslinking the compound in said composition;
- forming a photoresist layer on said composition;
- exposing said composition to light to yield an exposed portion of said composition;
- and
- contacting said composition with a developer so as to remove said exposed portion from said surface.
9 more elements
A microelectronic structure comprising:
- a substrate having a surface;
- and
- a crosslinked layer adjacent said substrate surface, said layer being formed from
- a composition comprising:
- a compound selected from the group consisting of polymers, oligomers, and mixtures thereof, said compound comprising acid groups other than phenolic groups, and having protected acid groups and unprotected acid groups, wherein the molar ratio of protected acid groups to unprotected acid groups is from about 1:3 to about 3:1;
- a chromophore;
- a vinyl ether crosslinker;
- and
- a solvent system, said compound, chromophore, and crosslinker being dissolved or dispersed in said solvent system;
- and
- a photoresist adjacent said crosslinked layer.
8 more elements
A method of forming a microelectronic structure, said method comprising the steps of:
- providing a substrate having a surface;
- applying a composition to said surface, said composition comprising:
- a compound selected from the group consisting of polymers, oligomers, and mixtures thereof, said compound comprising acid groups, and having protected acid groups and unprotected acid groups, wherein the molar ratio of protected acid groups to unprotected acid groups is from about 1:3 to about 3:1;
- a chromophore;
- a vinyl ether crosslinker;
- and
- from about 95-99% by weight of a solvent system, based upon the total weight of the composition taken as 100% by weight, said compound, chromophore, and crosslinker being dissolved or dispersed in said solvent system;
- and
- crosslinking the compound in said composition to yield a crosslinked composition having a k value of at least about 0.1 at the wavelength of use.
6 more elements
A microelectronic structure comprising:
- a substrate having a surface;
- and
- a crosslinked layer adjacent said substrate surface, said layer having a k value of at least about 0.1 at the wavelength of use and being formed from a composition comprising:
- a compound selected from the group consisting of polymers, oligomers, and mixtures thereof, said compound comprising acid groups, and having protected acid groups and unprotected acid groups, wherein the molar ratio of protected acid groups to unprotected acid groups is from about 1:3 to about 3:1;
- a chromophore;
- a vinyl ether crosslinker;
- and
- from about 95-99% by weight of a solvent system, based upon the total weight of the composition taken as 100% by weight, said compound, chromophore, and crosslinker being dissolved or dispersed in said solvent system.
5 more elements
A composition useful for forming microelectronic devices, said composition comprising:
- a compound selected from the group consisting of polymers, oligomers, and mixtures thereof, said compound comprising acid groups, and having protected acid groups and unprotected acid groups, wherein the molar ratio of protected acid groups to unprotected acid groups is from about 1:3 to about 3:1;
- from about 20 to about 40% by weight of a chromophore, based upon the total weight of the compound taken as 100% by weight;
- a vinyl ether crosslinker;
- and
- from about 95-99% by weight of a solvent system, based upon the total weight of the composition taken as 100% by weight, said compound, chromophore, and crosslinker being dissolved or dispersed in said solvent system,
- said composition being wet developable.
3 more elements
A method of forming a microelectronic structure, said method comprising the steps of:
- providing a substrate having a surface;
- applying a composition to said surface, said composition comprising:
- a compound selected from the group consisting of polymers, oligomers, and mixtures thereof, said compound comprising acid groups other than phenolic groups, and having protected acid groups and unprotected acid groups, wherein the molar ratio of protected acid groups to unprotected acid groups is from about 1:3 to about 3:1;
- from about 20 to about 40% by weight of a chromophore, based upon the total weight of the compound taken as 100% by weight;
- a vinyl ether crosslinker;
- and
- a solvent system, said compound, chromophore, and crosslinker being dissolved or dispersed in said solvent system;
- and
- crosslinking the compound in said composition.
6 more elements
A microelectronic structure comprising:
- a substrate having a surface;
- and
- a crosslinked layer adjacent said substrate surface, said layer being formed from
- a composition comprising:
- a compound selected from the group consisting of polymers, oligomers, and mixtures thereof, said compound comprising acid groups other than phenolic groups, and having protected acid groups and unprotected acid groups, wherein the molar ratio of protected acid groups to unprotected acid groups is from about 1:3 to about 3:1;
- from about 20 to about 40% by weight of a chromophore, based upon the total weight of the compound taken as 100% by weight;
- a vinyl ether crosslinker;
- and
- a solvent system, said compound, chromophore, and crosslinker being dissolved or dispersed in said solvent system.
6 more elements
Dependencies are inferred from the claim text.