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US 8,445,187 B2Granted
Hardmask composition having antireflective properties and method of patterning material on substrate using the same
AssigneeCheil Industries Inc.
InventorsKyong Ho Yoon, Jong Seob Kim, Dong Seon Uh, Hwan Sung Cheon, Chang Il Oh, Min Soo Kim, Jin Kuk Lee
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Abstract
A hardmask composition includes an organic solvent and one or more aromatic ring-containing polymers represented by Formulae 1, 2 and 3:
Claims13
A hardmask composition, comprising:
- (a) an organic solvent;
- and
- (b) at least one aromatic ring-containing polymer, the at least one aromatic ring-containing polymer including an aromatic ring-containing polymer represented by Formula 1
- wherein each R1 in Formula 1 is selected from:
- where, in R1, R is H or alkyl,
- wherein each R2 in Formula 1 is selected from:
- hydrogen, hydroxyl, C1-C10 alkyl, C6-C10 aryl, allyl, and halogen,
- wherein R3 in Formula 1 is selected from:
- wherein n in Formula 1 satisfies 1≦n<750.
6 more elements
Dependencies are inferred from the claim text.