H10W 20/0886
Involving forming a via in a via-level dielectric prior to deposition of
Official title: {involving forming a via in a via-level dielectric prior to deposition of a trench-level dielectric}
H10W20/0886 (Involving forming a via in a via-level dielectric prior to deposition of) appears on 250 US grants and 209 published applications in this corpus.
Search patents in H10W- Granted patents
- 250
- Published applications
- 209
- Assignees
- 73
- Inventors
- 395
- Latest grant
- 16 Jun 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1991 | 2 | 0 |
| 1992 | 4 | 0 |
| 1993 | 2 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 1 | 0 |
| 1997 | 2 | 0 |
| 1998 | 2 | 0 |
| 1999 | 5 | 0 |
| 2000 | 8 | 0 |
| 2001 | 10 | 4 |
| 2002 | 21 | 13 |
| 2003 | 20 | 12 |
| 2004 | 9 | 12 |
| 2005 | 7 | 10 |
| 2006 | 7 | 7 |
| 2007 | 8 | 5 |
| 2008 | 2 | 4 |
| 2009 | 7 | 4 |
| 2010 | 3 | 8 |
| 2011 | 4 | 9 |
| 2012 | 5 | 14 |
| 2013 | 9 | 11 |
| 2014 | 12 | 8 |
| 2015 | 15 | 9 |
| 2016 | 9 | 9 |
| 2017 | 8 | 7 |
| 2018 | 12 | 11 |
| 2019 | 13 | 11 |
| 2020 | 11 | 14 |
| 2021 | 12 | 11 |
| 2022 | 5 | 6 |
| 2023 | 6 | 3 |
| 2024 | 3 | 2 |
| 2025 | 4 | 3 |
| 2026 | 2 | 2 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
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Most cited
By later US patents
- Plasma processes for depositing low dielectric constant films671US 6,303,523 B1APPLIED Materials.Inc. · 2001
- Method for air gap interconnect integration using photo-patternable low k material424US 8,241,992 B2International Business Machines Corporation · 2012
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