H10P 72/0411
For wet cleaning or washing
Official title: {for wet cleaning or washing}
H10P72/0411 (For wet cleaning or washing) appears on 4,546 US grants and 5,778 published applications in this corpus.
Search patents in H10P- Granted patents
- 4,546
- Published applications
- 5,778
- Assignees
- 816
- Inventors
- 7,715
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 2 | 0 |
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 1 | 0 |
| 1981 | 1 | 0 |
| 1982 | 2 | 0 |
| 1983 | 0 | 0 |
| 1984 | 1 | 0 |
| 1985 | 3 | 0 |
| 1986 | 2 | 0 |
| 1987 | 2 | 0 |
| 1988 | 3 | 0 |
| 1989 | 6 | 0 |
| 1990 | 7 | 0 |
| 1991 | 7 | 0 |
| 1992 | 12 | 0 |
| 1993 | 13 | 0 |
| 1994 | 28 | 0 |
| 1995 | 19 | 0 |
| 1996 | 24 | 0 |
| 1997 | 36 | 0 |
| 1998 | 59 | 0 |
| 1999 | 107 | 0 |
| 2000 | 104 | 0 |
| 2001 | 126 | 55 |
| 2002 | 141 | 181 |
| 2003 | 170 | 188 |
| 2004 | 130 | 208 |
| 2005 | 114 | 182 |
| 2006 | 93 | 212 |
| 2007 | 97 | 229 |
| 2008 | 80 | 203 |
| 2009 | 75 | 206 |
| 2010 | 99 | 152 |
| 2011 | 140 | 145 |
| 2012 | 126 | 205 |
| 2013 | 126 | 198 |
| 2014 | 133 | 215 |
| 2015 | 138 | 217 |
| 2016 | 144 | 187 |
| 2017 | 199 | 237 |
| 2018 | 163 | 276 |
| 2019 | 183 | 259 |
| 2020 | 243 | 271 |
| 2021 | 210 | 257 |
| 2022 | 180 | 302 |
| 2023 | 242 | 341 |
| 2024 | 267 | 329 |
| 2025 | 276 | 300 |
| 2026 | 211 | 223 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Substrate processing system6 Oct 2026US 12,752,315 B2SCREEN Holdings Co., Ltd.
- Baffle inspection apparatus6 Oct 2026US 12,754,090 B2Samsung Electronics Co., Ltd.
- Apparatus for treating substrate and method for treating a substrate6 Oct 2026US 12,754,475 B2Semes Co., Ltd.
- Wet cleaning tool and method6 Oct 2026US 12,757,668 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Apparatus and methods for chemical mechanical polishing29 Sep 2026US 12,746,636 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Bowl assembly and substrate processing apparatus comprising the same8 Oct 2026US 2026/0307119 A1Samsung Electronics Co., Ltd.
- Semiconductor process system and method of cleaning the same8 Oct 2026US 2026/0308756 A1Samsung Electronics Co., Ltd.
- Substrate processing apparatus and substrate processing method8 Oct 2026US 2026/0314295 A1Ebara Corporation
- Substrate processing method and substrate processing apparatus8 Oct 2026US 2026/0314296 A1SCREEN Holdings Co., Ltd.
- Systems and methods for shuttered wafer cleaning8 Oct 2026US 2026/0314306 A1Taiwan Semiconductor Manufacturing Company.Ltd
Most cited
By later US patents
- Electronic substrate processing system using portable closed containers and its equipments568US 5,621,982 AShinko Electric Co., Ltd. · 1997
- Semiconductor device manufacturing system534US 6,212,789 B1Canon Sales Co., Inc. · 2001
- Apparatus for manufacturing semiconductor wafer510US 6,578,589 B1Super Silicon Crystal Research Institute Corp. · 2003
- Continuous processing system for chemical mechanical polishing501US 5,738,574 AAPPLIED Materials.Inc. · 1998
- Substrate treatment method and substrate treatment apparatus473US 9,698,031 B2SCREEN Holdings Co., Ltd. · 2017