Substrate treatment method and substrate treatment apparatus

A substrate treatment method comprising:

• an organic solvent replacing step of supplying, to an upper surface of a horizontally held substrate, an organic solvent having a lower surface tension than a rinse liquid adhering to the upper surface of the substrate, whereby a liquid film of the organic solvent is formed on the substrate as covering the upper surface of the substrate to replace the rinse liquid with the organic solvent;
• a substrate temperature increasing step of allowing a temperature of the upper surface of the substrate to reach a predetermined first temperature level higher than a boiling point of the organic solvent after the formation of the organic solvent liquid film, whereby a vapor film of the organic solvent is formed below the entire organic solvent liquid film between the organic solvent liquid film and the upper surface of the substrate, to levitate the organic solvent liquid film without disintegration, as a liquid mass, above the organic solvent vapor film;
• and
• an organic solvent removing step of removing the undisintegrated levitated organic solvent liquid film from above the upper surface of the substrate;
• wherein the organic solvent removing step includes a first step of removing the undisintegrated levitated organic solvent liquid film in the form of said liquid mass from above the upper surface of the substrate;
• and
• wherein the first step includes a step of contacting a guide surface of a guide member to a peripheral portion of the undisintegrated levitated organic solvent liquid film so that the organic solvent liquid film is guided to move laterally off the substrate.