H10P 30/22
Using masks
Official title: using masks
H10P30/22 (Using masks) appears on 3,847 US grants and 3,851 published applications in this corpus.
Search patents in H10P- Granted patents
- 3,847
- Published applications
- 3,851
- Assignees
- 701
- Inventors
- 5,875
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 4 | 0 |
| 1977 | 11 | 0 |
| 1978 | 11 | 0 |
| 1979 | 8 | 0 |
| 1980 | 13 | 0 |
| 1981 | 8 | 0 |
| 1982 | 8 | 0 |
| 1983 | 14 | 0 |
| 1984 | 13 | 0 |
| 1985 | 7 | 0 |
| 1986 | 9 | 0 |
| 1987 | 12 | 0 |
| 1988 | 11 | 0 |
| 1989 | 13 | 0 |
| 1990 | 11 | 0 |
| 1991 | 24 | 0 |
| 1992 | 20 | 0 |
| 1993 | 30 | 0 |
| 1994 | 24 | 0 |
| 1995 | 20 | 0 |
| 1996 | 30 | 0 |
| 1997 | 20 | 0 |
| 1998 | 42 | 0 |
| 1999 | 63 | 0 |
| 2000 | 73 | 0 |
| 2001 | 79 | 25 |
| 2002 | 74 | 61 |
| 2003 | 67 | 62 |
| 2004 | 64 | 83 |
| 2005 | 47 | 77 |
| 2006 | 59 | 86 |
| 2007 | 64 | 99 |
| 2008 | 43 | 90 |
| 2009 | 65 | 108 |
| 2010 | 99 | 91 |
| 2011 | 76 | 153 |
| 2012 | 101 | 124 |
| 2013 | 111 | 143 |
| 2014 | 174 | 165 |
| 2015 | 184 | 267 |
| 2016 | 272 | 292 |
| 2017 | 275 | 267 |
| 2018 | 215 | 258 |
| 2019 | 267 | 279 |
| 2020 | 233 | 205 |
| 2021 | 186 | 171 |
| 2022 | 139 | 191 |
| 2023 | 131 | 170 |
| 2024 | 119 | 164 |
| 2025 | 121 | 157 |
| 2026 | 83 | 63 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Semiconductor device6 Oct 2026US 12,757,479 B2Fuji Electric Co., Ltd.
- Semiconductor device and method of manufacturing the same6 Oct 2026US 12,757,481 B2Renesas Electronics Corporation
- High voltage semiconductor device and method of manufacturing same29 Sep 2026US 12,751,041 B2DB HiTek Co., Ltd.
- Doped well for semiconductor devices29 Sep 2026US 12,751,078 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Method for forming a drift region of a superjunction device22 Sep 2026US 12,745,432 B2Infineon Technologies AG
- Crystalline defect reduction in doped region8 Oct 2026US 2026/0314281 A1Texas Instruments Incorporated
- Silicon carbide semiconductor device1 Oct 2026US 2026/0304856 A1Fuji Electric Co., Ltd.
- Semiconductor device, semiconductor device manufacturing method, inverter circuit, drive device, vehicle, and elevator1 Oct 2026US 2026/0304858 A1Kabushiki Kaisha Toshiba
- Semiconductor device24 Sep 2026US 2026/0293229 A1Power Master Semiconductor Co., Ltd.
- Semiconductor device, method of manufacturing semiconductor device, inverter circuit, drive device, vehicle, and elevator10 Sep 2026US 2026/0271352 A1Kabushiki Kaisha Toshiba
Most cited
By later US patents
- Low-K gate spacers by fluorine implantation252US 6,720,213 B1International Business Machines Corporation · 2004
- High-voltage transistor with multi-layer conduction region222US 6,207,994 B1Power Integrations, Inc. · 2001
- Semiconductor device having metal silicide film220US 5,659,194 AMitsubishi Denki Kabushiki Kaisha · 1997
- Laterial thin-film silicon-on-insulator (SOI) device having a gate electrode and a field plate electrode205US 6,346,451 B1Philips Electronics North America Corporation · 2002
- Process for fabricating a non-volatile memory device194US 6,537,881 B1Advanced Micro Devices, Inc. · 2003