H01J 37/3288
Maintenance
Official title: {Maintenance}
H01J37/3288 (Maintenance) appears on 92 US grants and 163 published applications in this corpus.
Search patents in H01J- Granted patents
- 92
- Published applications
- 163
- Assignees
- 48
- Inventors
- 407
- Latest grant
- 31 Mar 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2004 | 0 | 1 |
| 2005 | 1 | 1 |
| 2006 | 0 | 0 |
| 2007 | 0 | 0 |
| 2008 | 0 | 0 |
| 2009 | 1 | 0 |
| 2010 | 0 | 0 |
| 2011 | 0 | 1 |
| 2012 | 1 | 4 |
| 2013 | 0 | 4 |
| 2014 | 1 | 4 |
| 2015 | 2 | 9 |
| 2016 | 7 | 13 |
| 2017 | 3 | 8 |
| 2018 | 7 | 9 |
| 2019 | 7 | 12 |
| 2020 | 14 | 14 |
| 2021 | 9 | 10 |
| 2022 | 5 | 11 |
| 2023 | 4 | 18 |
| 2024 | 13 | 17 |
| 2025 | 12 | 17 |
| 2026 | 5 | 10 |
By publication year. 2026 runs to 8 Oct.
Recent patents
- Substrate processing apparatus and method31 Mar 2026US 12,592,368 B2Semes Co., Ltd.
- Apparatus for treating substrate and method for measuring degree of wear of consumable component17 Mar 2026US 12,580,165 B2Semes Co., Ltd.
- Connect structure for semiconductor processing equipment24 Feb 2026US 12,562,347 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Linear arrangement for substrate processing tools24 Feb 2026US 12,562,356 B2Lam Research Corporation
- Semiconductor device manufacturing system and semiconductor device manufacturing method27 Jan 2026US 12,537,175 B2Hitachi High-Tech Corporation
- Portable robot for semiconductor equipment maintenance tasks3 Sep 2026US 2026/0257371 A1Lam Research Corporation
- Arc-resistant electrostatic chucks and arc-reducing plugs for electrostatic chucks20 Aug 2026US 2026/0245837 A1Lam Research Corporation
- Multl-step thermal chamber clean13 Aug 2026US 2026/0237614 A1Lam Research Corporation
- System and method for operating semiconductor fabrication apparatus13 Aug 2026US 2026/0237615 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Radical Sensing for Process Tool Diagnostics30 Jul 2026US 2026/0221402 A1MKS Instruments, Inc.
Most cited
By later US patents
- On-line chamber cleaning using dry ice blasting50US 8,292,698 B1Lam Research Corporation · 2012
- Ceramic article with reduced surface defect density and process for producing a ceramic article47US 9,034,199 B2APPLIED Materials.Inc. · 2015
- Processing device and method of maintaining the device, mechanism and method for assembling processing device part, and lock mechanism and method for locking the lock mechanism27US 6,899,786 B2Tokyo Electron Limited · 2005
- Controlling the RF amplitude of an edge ring of a capacitively coupled plasma process device12US 10,685,862 B2APPLIED Materials.Inc. · 2020
- Cleanliness monitor and a method for monitoring a cleanliness of a vacuum chamber7US 10,217,621 B2Applied Materials Israel Ltd. · 2019