Radical Sensing for Process Tool Diagnostics

An apparatus, comprising:

• a controller for use with a radical particle monitor operative to measure a concentration of radical particles within a gas sample obtained from a location within a semiconductor processing system having a process chamber while a process is being performed within the process chamber, the controller configured to:
• obtain radical data corresponding to a measured concentration of radical particles;
• compare the obtained radical data to at least one threshold;
• and
• output a first control signal when a result of the comparing indicates that the obtained radical data has a predetermined relationship with the at least one threshold, wherein the first control signal is configured to cause a chamber recovery process to be performed within the process chamber or indicate that a chamber recovery process should be performed within the process chamber.