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AssigneeTokyo Electron Limited
InventorsShigeru Senzaki, Toshiki Sasaki, Tadashi Aoto, Nobuyuki Nagayama, Kouji Mitsuhashi
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A processing device in which maintenance can be easily carried out and a burden on a worker can be reduced, and a method of maintaining the device are provided. An upper electrode unit 106 structuring a ceiling portion of a processing chamber 102 of an etching device 100 is structured from a lower assembly 128 at a processing chamber 102 side including an upper electrode 130, and an upper assembly 126 at a power supply side including an electro-body 144. A lock mechanism 156 is released, and after the upper assembly 126 is independently raised and removed by a lift mechanism 164, maintenance of the upper assembly 126 and/or the lower assembly 128 is carried out. The lock mechanism 156 is locked, and after the upper and lower assemblies 126, 128 are integrally raised and removed by the lift mechanism 164, maintenance of an interior of the processing chamber 102 is carried out.
A processing device having an upper electrode unit structuring a ceiling portion of a processing chamber, and a lift mechanism which can raise and lower the upper electrode unit, wherein
A method of maintaining a processing device having an upper electrode unit structuring a ceiling portion of a processing chamber, and a lift mechanism which can raise and lower the upper electrode unit, and the upper electrode unit is structured from a lower assembly at a processing chamber side and an upper assembly at a power supply side, and the lower assembly and the upper assembly can be separated and united by only a lock mechanism provided at an outer peripheral surface of the upper electrode unit, and the lower assembly can be airtightly fixed to the ceiling portion of the processing chamber by differential pressure between an interior and an exterior of the processing chamber and weight of the upper electrode unit without a mechanical mechanism, said method comprising the step of:
A method of maintaining a processing device having an upper electrode unit structuring a ceiling portion of a processing chamber, and a lift mechanism which can raise and lower the upper electrode unit, and the upper electrode unit is structured from a lower assembly at a processing chamber side and an upper assembly at a power supply side, and the lower assembly and the upper assembly can be separated and united by only a lock mechanism provided at an outer peripheral surface of the upper electrode unit, and the lower assembly can be airtightly fixed to the ceiling portion of the processing chamber by differential pressure between an interior and an exterior of the processing chamber and weight of the upper electrode unit without a mechanical mechanism, said method comprising the step of:
Dependencies are inferred from the claim text.