H01J 37/32651
Shields
Official title: {Shields, e.g. dark space shields, Faraday shields}
H01J37/32651 (Shields) appears on 368 US grants and 590 published applications in this corpus.
Search patents in H01J- Granted patents
- 368
- Published applications
- 590
- Assignees
- 107
- Inventors
- 1,232
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1984 | 1 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 1 | 1 |
| 2002 | 0 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 0 |
| 2006 | 0 | 2 |
| 2007 | 0 | 2 |
| 2008 | 0 | 3 |
| 2009 | 0 | 1 |
| 2010 | 1 | 4 |
| 2011 | 0 | 9 |
| 2012 | 2 | 15 |
| 2013 | 1 | 24 |
| 2014 | 12 | 34 |
| 2015 | 26 | 44 |
| 2016 | 21 | 32 |
| 2017 | 28 | 33 |
| 2018 | 25 | 40 |
| 2019 | 22 | 33 |
| 2020 | 29 | 47 |
| 2021 | 35 | 34 |
| 2022 | 34 | 74 |
| 2023 | 21 | 37 |
| 2024 | 45 | 41 |
| 2025 | 46 | 47 |
| 2026 | 17 | 33 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Plasma processing apparatus6 Oct 2026US 12,755,937 B2Tokyo Electron Limited
- Substrate processing apparatus, method of manufacturing semiconductor device and plasma generating apparatus22 Sep 2026US 12,744,182 B2Kokusai Electric Corporation
- Substrate treatment apparatus and substrate treatment method15 Sep 2026US 12,738,463 B2Psk Inc.
- RF blocker for uniformity control18 Aug 2026US 12,712,160 B2APPLIED Materials.Inc.
- Heat shield assemblies for minimizing heat radiation to pump of process chamber4 Aug 2026US 12,700,574 B2APPLIED Materials.Inc.
- Cover and plasma processing apparatus24 Sep 2026US 2026/0290761 A1Tokyo Electron Limited
- Rf blocker for uniformity control17 Sep 2026US 2026/0279740 A1APPLIED Materials.Inc.
- Controlling Azimuthal Uniformity of Etch Process in Plasma Processing Chamber17 Sep 2026US 2026/0282781 A1Beijing E-Town Semiconductor Technology Co., Ltd.
- Charged Particle Beam Device10 Sep 2026US 2026/0269194 A1Hitachi High-Tech Corporation
- Apparatus and method for cleaning susceptors with plasma10 Sep 2026US 2026/0269198 A1APPLIED Materials.Inc.
Most cited
By later US patents
- Semiconductor reaction chamber with plasma capabilities538US 9,018,111 B2ASM IP Holding B. V. · 2015
- Semiconductor reaction chamber with plasma capabilities501US 9,412,564 B2ASM IP Holding B. V. · 2016
- Technique to deposit sidewall passivation for high aspect ratio cylinder etch440US 9,997,373 B2Lam Research Corporation · 2018
- Dry plasma etch method to pattern MRAM stack56US 9,806,252 B2Lam Research Corporation · 2017
- Apparatus for plasma treatment51US 5,399,254 ALeybold Aktiengesellschaft · 1995