Charged Particle Beam Device

Abstract

A charged particle beam device 10 capable of preventing etching in a plasma generation chamber 18, preventing heat generation of an electrostatic shield 4 formed inside the plasma generation chamber 18, and obtaining a stable charged particle beam is implemented. The charged particle beam device 10 includes: a cylindrical dielectric body 14 forming the plasma generation chamber 18 therein; a cylindrical outer shield 3 disposed to surround an outer surface of the cylindrical dielectric body 14; the inner shield 4 disposed inside the plasma generation chamber 18 and facing the outer shield 3 via the dielectric body 14; a coil 2 disposed on an outer periphery of the outer shield 3 and configured to generate a radio frequency to generate plasma in the plasma generation chamber 18; an envelope 9 surrounding the coil 2, the outer shield 3, and the dielectric body 14; an aperture electrode 7 in which a hole 6 for extracting ions from the plasma generation chamber 18 is formed; and an extraction electrode 8 to which a voltage for extracting ions from the plasma generation chamber 18 is applied. A plurality of slits are formed in each of the outer shield 3 and the inner shield 4.

Dependencies are inferred from the claim text.