H01J 2237/026
Shields
H01J2237/026 (Shields) appears on 266 US grants and 340 published applications in this corpus.
Search patents in H01J- Granted patents
- 266
- Published applications
- 340
- Assignees
- 123
- Inventors
- 819
- Latest grant
- 29 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 1 | 0 |
| 1992 | 3 | 0 |
| 1993 | 2 | 0 |
| 1994 | 2 | 0 |
| 1995 | 5 | 0 |
| 1996 | 1 | 0 |
| 1997 | 2 | 0 |
| 1998 | 3 | 0 |
| 1999 | 2 | 0 |
| 2000 | 1 | 0 |
| 2001 | 1 | 0 |
| 2002 | 1 | 5 |
| 2003 | 1 | 1 |
| 2004 | 3 | 3 |
| 2005 | 1 | 2 |
| 2006 | 1 | 6 |
| 2007 | 2 | 7 |
| 2008 | 4 | 11 |
| 2009 | 7 | 7 |
| 2010 | 6 | 1 |
| 2011 | 6 | 15 |
| 2012 | 2 | 6 |
| 2013 | 11 | 13 |
| 2014 | 9 | 14 |
| 2015 | 18 | 18 |
| 2016 | 7 | 10 |
| 2017 | 12 | 13 |
| 2018 | 12 | 18 |
| 2019 | 12 | 22 |
| 2020 | 16 | 28 |
| 2021 | 16 | 14 |
| 2022 | 22 | 27 |
| 2023 | 18 | 31 |
| 2024 | 15 | 25 |
| 2025 | 22 | 27 |
| 2026 | 18 | 16 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Electrostatic chuck having extended lifetime29 Sep 2026US 12,751,248 B2APPLIED Materials.Inc.
- Electron-optical assembly comprising electromagnetic shielding8 Sep 2026US 12,731,754 B2ASML Netherlands B. V.
- Ion generation device and ion implanter18 Aug 2026US 12,712,144 B2Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Detector substrate for use in a charged particle multi-beam assessment tool11 Aug 2026US 12,706,272 B2ASML Netherlands B. V.
- Ion microscope14 Jul 2026US 12,683,113 B2National University of Singapore
- Shield arrangement for electron-optical module24 Sep 2026US 2026/0290742 A1ASML Netherlands B. V.
- Cover and plasma processing apparatus24 Sep 2026US 2026/0290761 A1Tokyo Electron Limited
- Charged Particle Beam Device10 Sep 2026US 2026/0269194 A1Hitachi High-Tech Corporation
- Particle beam system13 Aug 2026US 2026/0237594 A1Carl Zeiss Microscopy GmbH
- System, methods, and apparatuses with reduced noise current30 Jul 2026US 2026/0221373 A1ASML Netherlands B. V.
Most cited
By later US patents
- Substrate cleaning chamber and components488US 7,942,969 B2APPLIED Materials.Inc. · 2011
- Object-processing apparatus controlling production of particles in electric field or magnetic field380US 8,051,799 B2Renesas Electronics Corporation · 2011
- Plasma generating apparatus employing capacitive shielding and process for using such apparatus215US 5,234,529 A1993
- Scanning electron microscope and method for controlling a scanning electron microscope29US 5,424,541 AHitachi, Ltd. · 1995
- Plasma processing apparatus including condensation preventing means24US 5,342,471 ATokyo Electron Yamanashi Limited · 1994