H01J 2237/0262
Electrostatic
Official title: electrostatic
H01J2237/0262 (Electrostatic) appears on 50 US grants and 70 published applications in this corpus.
Search patents in H01J- Granted patents
- 50
- Published applications
- 70
- Assignees
- 29
- Inventors
- 168
- Latest grant
- 5 May 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1991 | 1 | 0 |
| 1992 | 2 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 0 |
| 2006 | 0 | 0 |
| 2007 | 0 | 2 |
| 2008 | 0 | 3 |
| 2009 | 4 | 0 |
| 2010 | 1 | 0 |
| 2011 | 0 | 3 |
| 2012 | 0 | 0 |
| 2013 | 1 | 0 |
| 2014 | 3 | 2 |
| 2015 | 3 | 4 |
| 2016 | 1 | 3 |
| 2017 | 2 | 4 |
| 2018 | 4 | 4 |
| 2019 | 3 | 6 |
| 2020 | 5 | 5 |
| 2021 | 3 | 5 |
| 2022 | 2 | 3 |
| 2023 | 3 | 6 |
| 2024 | 4 | 9 |
| 2025 | 5 | 6 |
| 2026 | 3 | 5 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Beam manipulator in charged particle-beam exposure apparatus5 May 2026US 12,620,547 B2ASML Netherlands B. V.
- Multi charged particle beam writing method and multi charged particle beam writing apparatus31 Mar 2026US 12,592,360 B2NuFlare Technology, Inc.
- Plasma producing apparatus17 Feb 2026US 12,555,743 B2SPTS Technologies Limited
- Apparatus for obtaining optical measurements in a charged particle apparatus21 Oct 2025US 12,451,321 B2ASML Netherlands B. V.
- Impedance control of local areas of a substrate during plasma deposition thereon in a large PECVD chamber19 Aug 2025US 12,394,606 B2APPLIED Materials.Inc.
- Shield arrangement for electron-optical module24 Sep 2026US 2026/0290742 A1ASML Netherlands B. V.
- Charged Particle Beam Device10 Sep 2026US 2026/0269194 A1Hitachi High-Tech Corporation
- System, methods, and apparatuses with reduced noise current30 Jul 2026US 2026/0221373 A1ASML Netherlands B. V.
- Plasma producing apparatus25 Jun 2026US 2026/0182279 A1SPTS Technologies Limited
- Foil lens correctors, charged particle microscope systems including the same, and associated methods2 Apr 2026US 2026/0094784 A1FEI Company
Most cited
By later US patents
- Apparatus for depositing a thin layer of sputtered atoms on a member23US 5,135,634 ASputtered Films, Inc. · 1992
- Photo-cathode image projection apparatus for patterning a semiconductor device11US 5,023,462 AFujitsu Limited · 1991
- Plasma etching reactor6US 5,082,547 APlasma Etch · 1992
- Charged particle multi-beamlet lithography system with modulation device6US 8,492,731 B2Mapper Lithography IP B.V. · 2013
- Charged particle multi-beamlet lithography system, modulation device, and method of manufacturing thereof6US 8,987,677 B2Mapper Lithography IP B.V. · 2015