Multi charged particle beam writing method and multi charged particle beam writing apparatus
AssigneeNuFlare Technology, Inc.
InventorsHirofumi Morita, Takanao Touya
Life of this patent
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Abstract
In one embodiment, a multi charged particle beam writing method includes forming a multi charged particle beam with which a substrate serving as a writing target is irradiated, deflecting the multi charged particle beam to a position with a predetermined deflection offset added so that deflection voltages respectively applied to a plurality of electrodes of an electrostatic positioning deflector does not include a state where all the deflection voltages are zero, and irradiating the substrate with the multi charged particle beam. A positive common voltage is added to the deflection voltages which are applied to the respective electrodes of the electrostatic positioning deflector.
Claims12
A multi charged particle beam writing method comprising:
- forming a multi charged particle beam with which a substrate serving as a writing target is irradiated;
- deflecting the multi charged particle beam to a position with a predetermined deflection offset added so that deflection voltages respectively applied to a plurality of electrodes of an electrostatic positioning deflector do not include a state where all the deflection voltages are zero and origins of the deflection voltages are not included in writing deflection regions, each of the writing deflection regions being shifted within a corresponding deflectable region deflectable regions such that the origins of the deflection voltages are not included in the writing deflection regions, and the deflection offset being constant during a writing operation;
- and
- irradiating an entirety of the substrate with the multi charged particle beam during the writing operation,
- wherein a positive common voltage is added to the deflection voltages which are applied to the respective electrodes of the electrostatic positioning deflector.
A multi charged particle beam writing apparatus comprising:
- an electrostatic positioning deflector including a plurality of electrodes and deflecting a multi charged particle beam with which a substrate serving as a writing target is irradiated;
- and
- a deflection control circuit performing deflection control on the multi charged particle beam at a position with a predetermined deflection offset added so that deflection voltages respectively applied to the plurality of electrodes do not include a state where all the deflection voltages are zero and origins of the deflection voltages are not included in writing deflection regions, each of the writing deflection regions being shifted within a corresponding deflectable region deflectable regions such that the origins of the deflection voltages are not included in the writing deflection regions, and the deflection offset being constant during a writing operation, wherein
- an entirety of the substrate is irradiated with the multi charged particle beam during the writing operation, and
- wherein a positive common voltage is added to the deflection voltages which are applied to the plurality of electrodes of the electrostatic positioning deflector respectively.
Dependencies are inferred from the claim text.