Plasma producing apparatus
AssigneeSPTS Technologies Limited
InventorsStephen R Burgess, Anthony Paul Wilby, Clive L Widdicks, Ian Moncrieff, P Densley
Life of this patent
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Abstract
A plasma producing apparatus for plasma processing a substrate Includes a chamber having an interior surface, a plasma production device for producing an inductively coupled plasma within the chamber, a substrate support for supporting the substrate during plasma processing, and a Faraday shield disposed within the chamber for shielding at least part of the interior surface from material removed from the substrate by the plasma processing. The plasma production device includes an antenna and a RF power supply for supplying RF power to the antenna with a polarity which is alternated at a frequency of less than or equal to 1000 Hz.
Claims20
A method of plasma processing a substrate comprising:
- producing a plasma in a chamber using a plasma production device comprising an antenna and a RF power supply for supplying RF power to the antenna;
- and
- plasma processing the substrate, in which:
- a Faraday shield is disposed within the chamber which shields at least part of an interior surface of the chamber from material removed from the substrate by the plasma processing;
- and
- RF power is supplied to the antenna with a polarity which is alternated at a frequency of less than or equal to 1000 Hz.
Dependencies are inferred from the claim text.