Charged particle multi-beamlet lithography system with modulation device

A modulation device for use in a charged particle lithography system for patterning a plurality of charged particle beamlets in accordance with a pattern, the beamlets defining a column, the modulation device serving to modulate the beamlets to prevent one or more of the beamlets from reaching the target surface or allow one or more of the beamlets to reach the target surface, by deflecting or not deflecting the beamlets, the modulation device comprising:

• a plurality of apertures arranged in arrays for letting the beamlets pass through the modulation device;
• a plurality of modulators arranged in arrays, each modulator provided with electrodes extending on opposing sides of an aperture for generating a voltage difference across the aperture;
• and
• a plurality of light sensitive elements arranged in arrays, for receiving modulated light beams and converting the light beams into electric signals for actuating the modulators, wherein the light sensitive elements are located within the column;
• wherein the modulation device is subdivided into a plurality of alternating beam areas and non-beam areas, the arrays of modulators are located in the beam areas, and the arrays of light sensitive elements are located in the non-beam areas and are in communication with the modulators in an adjacent beam area.

A method of transferring a pattern on to a target surface using a charged particle lithography system in particular according to any of the preceding claims, comprising the steps of:

• generating a plurality of beamlets defining a column;
• modulating the beamlets by deflecting or not deflecting the beamlets, for the purpose of completely or partly preventing the beamlets from reaching the target surface, under control of a control unit;
• transferring the passed beamlets to the target surface;
• wherein the modulating further comprises the steps of:
• optically transmitting data as modulated light beams carrying the pattern, to light sensitive elements;
• converting the modulated light beams received by the light sensitive elements into electric signals;
• actuating one or more modulators, on the basis of the electrical signals, to selectively deflect the beamlets for blocking or not blocking the beamlets from reaching the target surface, by means of deflection in an electric field.