H01J 2237/0266
Electromagnetic
Official title: electromagnetic
H01J2237/0266 (Electromagnetic) appears on 39 US grants and 55 published applications in this corpus.
Search patents in H01J- Granted patents
- 39
- Published applications
- 55
- Assignees
- 33
- Inventors
- 166
- Latest grant
- 8 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1993 | 1 | 0 |
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 1 | 0 |
| 2002 | 0 | 1 |
| 2003 | 0 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 0 |
| 2006 | 0 | 0 |
| 2007 | 0 | 1 |
| 2008 | 0 | 1 |
| 2009 | 0 | 1 |
| 2010 | 1 | 0 |
| 2011 | 0 | 1 |
| 2012 | 0 | 1 |
| 2013 | 2 | 2 |
| 2014 | 1 | 4 |
| 2015 | 4 | 2 |
| 2016 | 1 | 1 |
| 2017 | 2 | 2 |
| 2018 | 1 | 4 |
| 2019 | 4 | 4 |
| 2020 | 1 | 4 |
| 2021 | 2 | 2 |
| 2022 | 5 | 8 |
| 2023 | 3 | 4 |
| 2024 | 3 | 2 |
| 2025 | 4 | 6 |
| 2026 | 2 | 4 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Electron-optical assembly comprising electromagnetic shielding8 Sep 2026US 12,731,754 B2ASML Netherlands B. V.
- Particle beam system21 Apr 2026US 12,609,272 B2Carl Zeiss Microscopy GmbH
- Apparatus for arcing diagnosis, plasma process equipment including the same, and arcing diagnosis method30 Sep 2025US 12,431,341 B2Samsung Electronics Co., Ltd.
- Radio frequency screen for an ultraviolet lamp system5 Aug 2025US 12,381,068 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Magnetic field suppression system6 May 2025US 12,293,861 B2Technical Manufacturing Corporation
- Cover and plasma processing apparatus24 Sep 2026US 2026/0290761 A1Tokyo Electron Limited
- Particle beam system13 Aug 2026US 2026/0237594 A1Carl Zeiss Microscopy GmbH
- Process chamber and substrate processing apparatus2 Jul 2026US 2026/0188624 A1Semes Co., Ltd.
- Ion implantation device18 Jun 2026US 2026/0171344 A1Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Black body surface generation using laser material processing18 Dec 2025US 2025/0385068 A1APPLIED Materials.Inc.
Most cited
By later US patents
- Plasma generating apparatus employing capacitive shielding and process for using such apparatus215US 5,234,529 A1993
- Plasma processing apparatus including condensation preventing means24US 5,342,471 ATokyo Electron Yamanashi Limited · 1994
- Specimen holder, specimen inspection apparatus, specimen inspection method, and method of fabricating specimen holder9US 7,745,802 B2JEOL Ltd. · 2010
- Apparatus for controlling the temperature of an RF ion source window8US 8,436,318 B2Varian Semiconductor Equipment Associates, Inc. · 2013
- XRF analyzer5US 9,775,574 B2Moxtek, Inc. · 2017