Apparatus for controlling the temperature of an RF ion source window
AssigneeVarian Semiconductor Equipment Associates, Inc.
InventorsFrank Sinclair, Costel Biloiu, Bon-Woong Koo, Victor Benveniste, Shardul Patel
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Abstract
An RF ion source utilizing a heating/RF-shielding element for controlling the temperature of an RF window and to act as an RF shielding element for the RF ion source. When the heating/RF shielding element is in a heating mode, it suppresses formation of unwanted deposits on the RF window which negatively impacts the transfer of RF energy from an RF antenna to a plasma chamber. When the heating/RF-shielding element is in a shielding mode, it provides an electrostatic shielding for the RF ion source.
Claims18
An RF ion source comprising:
- a plasma chamber;
- an RF antenna configured to provide RF energy to said plasma chamber;
- an RF window disposed between said plasma chamber and said RF antenna, said RF window having a surface exposed to an interior of said plasma chamber;
- a heating/RF-shielding element disposed between said surface of said RF window and said RF antenna, said heating/RF-shielding element having a first mode of operation configured to heat at least a portion of said RF window to suppress the formation of deposits on said surface of said RF window and a second mode of operation configured to provide an electrostatic shield for said ion source, wherein said heating/RF-shielding element comprises a cover that is electrically-conductive;
- a grounding strip connected to said cover;
- and
- extracting electrodes connected to extract ions from said plasma chamber for formation into an ion beam.
An RF ion source comprising:
- a plasma chamber;
- an RF antenna configured to provide RF energy to said plasma chamber;
- an RF window disposed between said plasma chamber and said RF antenna, said RF window having a surface exposed to an interior of said plasma chamber;
- a heating/RF-shielding element disposed between said surface of said RF window and said RF antenna, said heating/RF-shielding element having a first mode of operation configured to heat at least a portion of said RF window to suppress the formation of deposits on said surface of said RF window and a second mode of operation configured to provide an electrostatic shield for said RF ion source, said heating/RF-shielding element being surrounded by a cover that is electrically-conductive;
- a grounding strip connected to said cover;
- an outer window insulator disposed between said heating/RF-shielding element and said RF antenna, said outer window insulator insulating said plasma chamber at a vacuum from ambient air;
- and
- extraction electrodes configured to extract ions from said plasma chamber for formation into an ion beam.
Dependencies are inferred from the claim text.