Ion implantation device
AssigneeSumitomo Heavy Industries Ion Technology Co., Ltd.
InventorsHaruka SASAKI, Takaaki MATSUMOTO, Yukio KUMATA
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AssigneeSumitomo Heavy Industries Ion Technology Co., Ltd.
InventorsHaruka SASAKI, Takaaki MATSUMOTO, Yukio KUMATA
Estimating the term…
Provided is a technology that enables at least some of a plurality of resonators, which are provided in an ion implanter, to have a simpler configuration. An ion implanter includes a linear acceleration unit that adjusts energy of ions, the linear acceleration unit includes a plurality of resonators, each of the plurality of resonators includes: an electrode for generating a radio-frequency electric field, the electrode being configured to accelerate or decelerate the ions by generating the radio-frequency electric field; a coil; a stem that connects the electrode and the coil; and a housing that surrounds the coil, and at least one of the plurality of resonators is configured, such that a gas for cooling at least the coil is present inside the housing, and has a configuration for generating a flow of the gas for promoting the cooling of at least the coil in a vicinity of the coil.
An ion implanter comprising:
Dependencies are inferred from the claim text.