H01J 2237/0203
Protection arrangements
H01J2237/0203 (Protection arrangements) appears on 450 US grants and 488 published applications in this corpus.
Search patents in H01J- Granted patents
- 450
- Published applications
- 488
- Assignees
- 213
- Inventors
- 1,154
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 1 | 0 |
| 1986 | 4 | 0 |
| 1987 | 1 | 0 |
| 1988 | 1 | 0 |
| 1989 | 1 | 0 |
| 1990 | 3 | 0 |
| 1991 | 3 | 0 |
| 1992 | 0 | 0 |
| 1993 | 5 | 0 |
| 1994 | 3 | 0 |
| 1995 | 7 | 0 |
| 1996 | 8 | 0 |
| 1997 | 6 | 0 |
| 1998 | 7 | 0 |
| 1999 | 11 | 0 |
| 2000 | 9 | 0 |
| 2001 | 11 | 2 |
| 2002 | 6 | 10 |
| 2003 | 8 | 11 |
| 2004 | 6 | 19 |
| 2005 | 13 | 18 |
| 2006 | 8 | 21 |
| 2007 | 14 | 16 |
| 2008 | 9 | 34 |
| 2009 | 13 | 28 |
| 2010 | 19 | 15 |
| 2011 | 31 | 17 |
| 2012 | 10 | 9 |
| 2013 | 14 | 13 |
| 2014 | 15 | 17 |
| 2015 | 16 | 22 |
| 2016 | 16 | 15 |
| 2017 | 20 | 19 |
| 2018 | 15 | 20 |
| 2019 | 17 | 19 |
| 2020 | 21 | 23 |
| 2021 | 17 | 21 |
| 2022 | 18 | 20 |
| 2023 | 18 | 26 |
| 2024 | 12 | 22 |
| 2025 | 18 | 25 |
| 2026 | 14 | 26 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Electrostatically secured substrate support assembly6 Oct 2026US 12,755,944 B2APPLIED Materials.Inc.
- Electrostatic chuck having extended lifetime29 Sep 2026US 12,751,248 B2APPLIED Materials.Inc.
- Beam position displacement correction in charged particle inspection15 Sep 2026US 12,738,445 B2ASML Netherlands B. V.
- Electron beam irradiation device18 Aug 2026US 12,712,143 B2Nhv Corporation
- Stage device, charged particle beam apparatus, and vacuum apparatus18 Aug 2026US 12,712,145 B2Hitachi High-Tech Corporation
- Wafer placement table8 Oct 2026US 2026/0311975 A1NGK Corporation
- Shield arrangement for electron-optical module24 Sep 2026US 2026/0290742 A1ASML Netherlands B. V.
- Electron emission apparatus and electronic apparatus10 Sep 2026US 2026/0269164 A1Westlake University
- Charged Particle Beam Device3 Sep 2026US 2026/0260845 A1Hitachi High-Tech Corporation
- Process chamber process kit with protective coating3 Sep 2026US 2026/0260852 A1APPLIED Materials.Inc.
Most cited
By later US patents
- Reactor useful for chemical vapor deposition of titanium nitride526US 6,106,625 AAPPLIED Materials.Inc. · 2000
- Substrate cleaning chamber and components488US 7,942,969 B2APPLIED Materials.Inc. · 2011
- Method and apparatus for protection of conductive surfaces in a plasma processing reactor319US 5,366,585 AAPPLIED Materials.Inc. · 1994
- Spark eliminating sputtering target and method for using and making same238US 5,922,176 ADonnelly Corporation · 1999
- Enhanced reactive DC sputtering system162US 5,718,813 AAdvanced Energy Industries, Inc. · 1998