H01J 2237/0209
Avoiding or diminishing effects of eddy currents
H01J2237/0209 (Avoiding or diminishing effects of eddy currents) appears on 7 US grants and 9 published applications in this corpus.
Search patents in H01J- Granted patents
- 7
- Published applications
- 9
- Assignees
- 10
- Inventors
- 35
- Latest grant
- 15 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 2 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 2 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 1 |
| 2002 | 0 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 0 |
| 2006 | 0 | 1 |
| 2007 | 0 | 0 |
| 2008 | 0 | 1 |
| 2009 | 0 | 1 |
| 2010 | 0 | 0 |
| 2011 | 0 | 1 |
| 2012 | 0 | 0 |
| 2013 | 0 | 1 |
| 2014 | 1 | 0 |
| 2015 | 0 | 0 |
| 2016 | 0 | 0 |
| 2017 | 0 | 0 |
| 2018 | 0 | 0 |
| 2019 | 0 | 0 |
| 2020 | 0 | 1 |
| 2021 | 0 | 0 |
| 2022 | 0 | 0 |
| 2023 | 0 | 0 |
| 2024 | 0 | 0 |
| 2025 | 0 | 1 |
| 2026 | 1 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Beam position displacement correction in charged particle inspection15 Sep 2026US 12,738,445 B2ASML Netherlands B. V.
- Electron microscope and method of adjusting the same14 Oct 2014US 8,859,964 B2JEOL Ltd.
- Inductively coupled plasma sputter chamber with conductive material sputtering capabilities29 Oct 1996US 5,569,363 AMaterials Research Corporation
- Magnetic deflection system for a high-power electron beam2 Jul 1996US 5,532,446 ALeybold Durferrit GmbH
- Magnetic object lens for an electron beam exposure apparatus which processes a wafer carried on a continuously moving stage29 May 1990US 4,929,838 AFujitsu Limited
- System, methods, and apparatuses with reduced noise current30 Jul 2026US 2026/0221373 A1ASML Netherlands B. V.
- Beam position displacement correction in charged particle inspection30 Jan 2025US 2025/0037961 A1ASML Netherlands B. V.
- Electron beam inspection tool and method for positioning an object table24 Sep 2020US 2020/0303158 A1ASML Netherlands B. V.
- Electron Microscope and Method of Adjusting the Same12 Dec 2013US 2013/0327938 A1JEOL Ltd.
- Magnetron assembly13 Jan 2011US 2011/0005926 A1Applied Materials, Inc.
Most cited
By later US patents
- Inductively coupled plasma sputter chamber with conductive material sputtering capabilities68US 5,569,363 AMaterials Research Corporation · 1996
- Magnetic object lens for an electron beam exposure apparatus which processes a wafer carried on a continuously moving stage11US 4,929,838 AFujitsu Limited · 1990
- Electron beam exposure apparatus8US 4,585,943 AFujitsu Limited · 1986
- Charged particle beam exposure system and method of compensating for eddy current effect on charged particle beam7US 4,891,524 AFujitsu Limited · 1990
- Magnetic deflection system for a high-power electron beam2US 5,532,446 ALeybold Durferrit GmbH · 1996