Electron beam exposure apparatus

An electron beam exposure apparatus for selectively exposing a desired area of a medium to be processed with an electron beam, comprising:

• electron emitting means for emitting the electron beam;
• control means for providing a first digital signal and a second digital signal, the position on the medium where the electron beam is irradiated being determined by the first and second digital signals;
• deflection means, operatively connected to said control means, for deflecting the electron beam, in response to the first and second digital signals, so as to expose the desired area of the medium, said deflection means comprising electromagnetic deflection means and electrostatic deflection means, a first analog signal, corresponding to the first digital signal, being supplied to said electromagnetic deflection means and a second analog signal, corresponding to the second digital signal, being supplied to said electrostatic deflection means;
• and
• compensation signal generating means, operatively connected to said deflection means, for receiving the first analog signal and supplying a compensation signal, in accordance with the first analog signal, to said electromagnetic deflection means to compensate for a position error of the electron beam on the medium due to an eddy current generated in said electron beam exposure apparatus, said compensation signal generating means including:
• a digital to analog converter, operatively connected to said control means, for providing the first and second analog signals in response to the first and second digital signals, respectively;
• and
• a first differential circuit, operatively connected to said digital to analog converter, for providing the compensation signal in response to the first analog signal.