H01J 2237/0213
Avoiding deleterious effects due to interactions between particles and tube elements
H01J2237/0213 (Avoiding deleterious effects due to interactions between particles and tube elements) appears on 124 US grants and 157 published applications in this corpus.
Search patents in H01J- Granted patents
- 124
- Published applications
- 157
- Assignees
- 60
- Inventors
- 334
- Latest grant
- 18 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 1 | 0 |
| 2001 | 2 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 1 |
| 2005 | 1 | 4 |
| 2006 | 2 | 6 |
| 2007 | 3 | 3 |
| 2008 | 5 | 6 |
| 2009 | 2 | 13 |
| 2010 | 6 | 2 |
| 2011 | 8 | 2 |
| 2012 | 1 | 2 |
| 2013 | 7 | 4 |
| 2014 | 1 | 5 |
| 2015 | 4 | 9 |
| 2016 | 9 | 8 |
| 2017 | 7 | 6 |
| 2018 | 7 | 9 |
| 2019 | 5 | 10 |
| 2020 | 9 | 8 |
| 2021 | 7 | 12 |
| 2022 | 9 | 5 |
| 2023 | 8 | 9 |
| 2024 | 3 | 6 |
| 2025 | 6 | 14 |
| 2026 | 8 | 13 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
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Most cited
By later US patents
- Substrate cleaning chamber and components488US 7,942,969 B2APPLIED Materials.Inc. · 2011
- Deposition shield assembly for a semiconductor wafer processing system52US 6,051,122 AAPPLIED Materials.Inc. · 2000
- Ion source and plasma processing apparatus43US 8,356,575 B2Ulvac, Inc. · 2013
- Charged particle beam irradiation apparatus21US 6,172,364 B2Kabushiki Kaisha Toshiba · 2001
- Protective coating for a plasma processing chamber part and a method of use20US 8,522,716 B2Lam Research Corporation · 2013