G03F 7/0395
The macromolecular compound having a backbone with alicyclic moieties
Official title: {the macromolecular compound having a backbone with alicyclic moieties}
G03F7/0395 (The macromolecular compound having a backbone with alicyclic moieties) appears on 562 US grants and 647 published applications in this corpus.
Search patents in G03F- Granted patents
- 562
- Published applications
- 647
- Assignees
- 108
- Inventors
- 820
- Latest grant
- 15 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2000 | 2 | 0 |
| 2001 | 6 | 7 |
| 2002 | 23 | 71 |
| 2003 | 45 | 99 |
| 2004 | 73 | 65 |
| 2005 | 51 | 63 |
| 2006 | 43 | 40 |
| 2007 | 47 | 38 |
| 2008 | 23 | 22 |
| 2009 | 32 | 24 |
| 2010 | 29 | 22 |
| 2011 | 24 | 15 |
| 2012 | 18 | 18 |
| 2013 | 11 | 17 |
| 2014 | 21 | 12 |
| 2015 | 22 | 18 |
| 2016 | 21 | 21 |
| 2017 | 17 | 11 |
| 2018 | 12 | 13 |
| 2019 | 10 | 9 |
| 2020 | 6 | 7 |
| 2021 | 8 | 5 |
| 2022 | 2 | 3 |
| 2023 | 5 | 9 |
| 2024 | 4 | 8 |
| 2025 | 1 | 17 |
| 2026 | 6 | 13 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Resist composition and method for forming resist pattern15 Sep 2026US 12,736,875 B2Tokyo Ohka Kogyo.Co., Ltd.
- Bismaleimide compound, composition containing same, polybenzoxazole, and semiconductor device15 Sep 2026US 12,736,879 B2Nippon Kayaku Kabushiki Kaisha
- Photosensitive resin composition and manufacturing method of display device using the same14 Jul 2026US 12,681,385 B2Ltc Co., Ltd.
- Polymer compositions having photoacid generators and photoresists21 Apr 2026US 12,607,933 B2Dupont Electronics, Inc.
- Photoacid generator, chemically amplified resist composition, and patterning process24 Mar 2026US 12,585,186 B2Shin-Etsu Chemical Co., Ltd.
- Resist composition, resist pattern formation method, compound, and polymer compound8 Oct 2026US 2026/0310077 A1Tokyo Ohka Kogyo.Co., Ltd.
- Resist composition and resist pattern formation method1 Oct 2026US 2026/0299410 A1Tokyo Ohka Kogyo.Co., Ltd.
- Onium salt, chemically amplified resist composition, and pattern forming process6 Aug 2026US 2026/0226003 A1Shin-Etsu Chemical Co., Ltd.
- Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for producing electronic device23 Jul 2026US 2026/0211326 A1FUJIFILM Corporation
- Photosensitive resin composition, resin film having pattern and method for producing same, and semiconductor circuit board16 Jul 2026US 2026/0202742 A1Jsr Corporation
Most cited
By later US patents
- Polymers for photoresist and photoresist compositions using the same474US 6,569,971 B2Hyundai Electronics Industries Co., Ltd. · 2003
- Photoresist polymer and photoresist composition containing the same471US 7,279,256 B2Hynix Semiconductor Inc. · 2007
- Photoresist monomers, polymers and photoresist compositions for preventing acid diffusion469US 6,924,078 B2Dongjin Semichem Co., Ltd. · 2005
- Polymers for photoresist and photoresist compositions using the same469US 6,987,155 B2Hyundai Electronics Industries Co., Ltd. · 2006
- Lactone-containing compounds, polymers, resist compositions, and patterning method118US 6,280,898 B1Shin-Etsu Chemical Co., Ltd. · 2001