G03F 7/039
Macromolecular compounds which are photodegradable
Official title: Macromolecular compounds which are photodegradable, e.g. positive electron resists (G03F7/075 takes precedence; macromolecular quinonediazides G03F7/023)
G03F7/039 (Macromolecular compounds which are photodegradable) appears on 4,936 US grants and 5,881 published applications in this corpus.
Search patents in G03F- Granted patents
- 4,936
- Published applications
- 5,881
- Assignees
- 630
- Inventors
- 5,199
- Latest grant
- 22 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 18 | 0 |
| 1977 | 11 | 0 |
| 1978 | 11 | 0 |
| 1979 | 4 | 0 |
| 1980 | 1 | 0 |
| 1981 | 21 | 0 |
| 1982 | 12 | 0 |
| 1983 | 22 | 0 |
| 1984 | 10 | 0 |
| 1985 | 8 | 0 |
| 1986 | 18 | 0 |
| 1987 | 10 | 0 |
| 1988 | 9 | 0 |
| 1989 | 26 | 0 |
| 1990 | 16 | 0 |
| 1991 | 32 | 0 |
| 1992 | 27 | 0 |
| 1993 | 28 | 0 |
| 1994 | 43 | 0 |
| 1995 | 22 | 0 |
| 1996 | 28 | 0 |
| 1997 | 28 | 0 |
| 1998 | 51 | 0 |
| 1999 | 68 | 0 |
| 2000 | 111 | 0 |
| 2001 | 109 | 61 |
| 2002 | 136 | 212 |
| 2003 | 149 | 257 |
| 2004 | 208 | 202 |
| 2005 | 136 | 208 |
| 2006 | 137 | 199 |
| 2007 | 154 | 179 |
| 2008 | 123 | 189 |
| 2009 | 146 | 254 |
| 2010 | 148 | 244 |
| 2011 | 184 | 220 |
| 2012 | 172 | 286 |
| 2013 | 194 | 278 |
| 2014 | 283 | 219 |
| 2015 | 294 | 229 |
| 2016 | 227 | 264 |
| 2017 | 201 | 255 |
| 2018 | 186 | 207 |
| 2019 | 198 | 236 |
| 2020 | 132 | 221 |
| 2021 | 135 | 219 |
| 2022 | 130 | 224 |
| 2023 | 168 | 267 |
| 2024 | 119 | 251 |
| 2025 | 124 | 272 |
| 2026 | 108 | 228 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Critical dimension inspection method and semiconductor device manufacturing method using the same22 Sep 2026US 12,743,026 B2Samsung Electronics Co., Ltd.
- Hybrid method of forming microstructure array molds, methods of making microstructure arrays, and methods of use15 Sep 2026US 12,734,730 B2Panther Life Sciences Corporation
- Compound, (co)polymer, composition, method for forming pattern, and method for producing compound15 Sep 2026US 12,735,382 B2Mitsubishi Gas Chemical Company, Inc.
- Polymer and method for producing same, and resin composition for resist15 Sep 2026US 12,735,519 B2Maruzen Petrochemical Co., Ltd.
- Resist composition and method for forming resist pattern15 Sep 2026US 12,736,875 B2Tokyo Ohka Kogyo.Co., Ltd.
- Onium salt monomer, polymer, chemically amplified resist composition, and pattern forming process8 Oct 2026US 2026/0310075 A1Shin-Etsu Chemical Co., Ltd.
- Photosensitive resin composition, cured substance, laminate, manufacturing method for cured substance, manufacturing method for laminate, manufacturing method for semiconductor device, semiconductor device, polyimide, manufacturing method for polyimide, and compound8 Oct 2026US 2026/0310076 A1FUJIFILM Corporation
- Resist composition, resist pattern formation method, compound, and polymer compound8 Oct 2026US 2026/0310077 A1Tokyo Ohka Kogyo.Co., Ltd.
- Resist composition and resist pattern formation method1 Oct 2026US 2026/0299410 A1Tokyo Ohka Kogyo.Co., Ltd.
- Resist composition, resist pattern formation method, compound and polymer compound1 Oct 2026US 2026/0299419 A1Tokyo Ohka Kogyo.Co., Ltd.
Most cited
By later US patents
- Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone645US 4,491,628 AInternational Business Machines Corporation · 1985
- Apparatus and method for photoetching of polyimides, polycarbonates and polyetherimides552US 4,857,382 AGeneral Electric Company · 1989
- Polymer and a forming method of a micro pattern using the same493US 6,225,020 B1Hyundai Electronics Industries Co., Ltd. · 2001
- Photoresist monomers, polymers thereof and photoresist compositions containing it483US 6,514,666 B1Hyundai Electronics Industries Co., Ltd. · 2003
- Polymer and a forming method of a micro pattern using the same482US 6,316,162 B1Hyundai Electronics Industries Co., Ltd. · 2001