Polymer and method for producing same, and resin composition for resist

Abstract

[Problem to be Solved] The present invention provides a polymer comprising a structural unit derived from p-hydroxystyrene and a structural unit having a structure in which a carboxylic acid is protected by an acetal group, wherein the structural unit generated by elimination of the acetal group or migration of the acetal group during the production process is extremely small; and a process for producing the same. [Means for Solving the Problem] A solution containing a polymer comprising a structural unit derived from p-acetoxystyrene and a structural unit having a structure in which a carboxylic acid is protected by an acetal group is subjected to deprotection reaction at 50° C. or lower in the presence of a base in which a pKa of a conjugated acid is 12 or more.

Dependencies are inferred from the claim text.