Resist composition, resist pattern formation method, compound, and polymer compound
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorShuichi ISHII
Life of this patent
Estimating the term…
Abstract
A resist composition containing a resin component whose solubility in a developing solution is changed by an action of an acid. The resin component has a constitutional unit derived from a compound represented by Formula (a0-1) below. In the formula, W01 represents a polymerizable group-containing group; La01 represents an aromatic hydrocarbon group or an alicyclic hydrocarbon group; La02 represents a divalent linking group; Ar01 represents an aromatic hydrocarbon group; Ya01 represents a divalent linking group or a single bond; Va01 represents a single bond, an alkylene group, or a fluorinated alkylene group; Ra01 represents a hydrogen atom, a fluorine atom, or a fluorinated alkyl group having 1 to 5 carbon atoms; and Mm+ represents an m-valent cation
Claims10
A resist composition which generates an acid upon light exposure and whose solubility in a developing solution is changed by an action of the acid, the resist composition comprising:
- a resin component (A1) whose solubility in a developing solution is changed by the action of the acid,
- wherein the resin component (A1) has a constitutional unit (a0) derived from a compound represented by General Formula (a0-1),
- wherein W01 represents a polymerizable group-containing group, La01 represents an aromatic hydrocarbon group which may have a substituent or an alicyclic hydrocarbon group which may have a substituent, La02 represents a divalent linking group, Ar01 represents an aromatic hydrocarbon group which may have a substituent, Ya01 represents a divalent linking group or a single bond, Va01 represents a single bond, an alkylene group, or a fluorinated alkylene group, where both Ya01 and Va01 do not represent a single bond at the same time, Ra01 represents a hydrogen atom, a fluorine atom, or a fluorinated alkyl group having 1 to 5 carbon atoms, m represents an integer of 1 or greater, and Mm+ represents an m-valent cation.
A compound represented by General Formula (m0-1),
- wherein W01 represents a polymerizable group-containing group, La01 represents an aromatic hydrocarbon group which may have a substituent or an alicyclic hydrocarbon group which may have a substituent, La02 represents a divalent linking group, Ar01 represents an aromatic hydrocarbon group which may have a substituent, Ya01 represents a divalent linking group or a single bond, Va01 represents a single bond, an alkylene group, or a fluorinated alkylene group, where both Ya01 and Va01 do not represent a single bond at the same time, Ra01 represents a hydrogen atom, a fluorine atom, or a fluorinated alkyl group having 1 to 5 carbon atoms, m represents an integer of 1 or greater, and Mm+ represents an m-valent cation.
Dependencies are inferred from the claim text.