Photosensitive resin composition and manufacturing method of display device using the same

A photosensitive resin composition comprising:

• a silsesquioxane-based copolymer obtained by copolymerizing
• a first monomer,
• a second monomer,
• a third monomer, and
• a fourth monomer,
• which are different from each other;
• a quinonediazide-based photosensitive compound;
• a surfactant;
• and
• a glycol-based solvent,
• wherein the third monomer is represented by Chemical Formula 3,
• Si(R6)4, and Chemical Formula 3
• wherein
• R6 is a substituted or unsubstituted alkoxy group having one to three carbon atoms,
• wherein the third monomer comprises at least one of tetramethoxysilane, tetraethoxysilane, or tetrapropoxysilane,
• wherein the first monomer comprises a (1-1)-st monomer and a (1-2)-nd monomer different from the (1-1)-st monomer, and
• the (1-1)-st monomer is represented by Chemical Formula 1-1, and the (1-2)-nd monomer is represented by Chemical Formula 1-2,
• R1—R2—Si(R3)3 Chemical Formula 1-1
• R1—R2—Si(R3)3, and Chemical Formula 1-2
• wherein, in Chemical Formula 1-1 and Chemical Formula 1-2, R1-1 is a substituted or unsubstituted mercapto group, R1-2 is a substituted or unsubstituted furanyl group, R2 is a direct linkage, or a substituted or unsubstituted divalent alkyl group having three to six carbon atoms, and R3 is a substituted or unsubstituted alkoxy group having one to three carbon atoms.

A manufacturing method of a display device, the manufacturing method comprising:

• forming an organic insulating layer on a base layer;
• and
• forming a pixel-defining film on the organic insulating layer,
• wherein at least one of the organic insulating layer or the pixel-defining film is formed of a photosensitive resin composition, and
• the photosensitive resin composition comprises a silsesquioxane-based copolymer obtained by copolymerizing a first monomer comprising a (1-1)-st monomer and a (1-2)-nd monomer different from the (1-1)-st monomer, the (1-1)-st monomer being represented by Chemical Formula 1-1, and the (1-2)-nd monomer being represented by Chemical Formula 1-2, a second monomer represented by Chemical Formula 2, a third monomer represented by Chemical Formula 3, and a fourth monomer represented by Chemical Formula 4,
• R1-1—R2—Si(R3)3 Chemical Formula 1-1
• R1-2—R2—Si(R3)3 Chemical Formula 1-2
• (R4)n—Si(R5)4-n Chemical Formula 2
• Si(R6)4 Chemical Formula 3
• (R7)3—Si—R8—Si—(R7)3, and Chemical Formula 4
• wherein, in Chemical Formulas 1-1, 1-2, and 2 to 4,
• R2 is a direct linkage, or a substituted or unsubstituted divalent alkyl group having three to six carbon atoms,
• R3, and R5 to R7 are each independently a substituted or unsubstituted alkoxy group having one to three carbon atoms,
• R4 is a substituted or unsubstituted alkyl group having one to three carbon atoms, or a substituted or unsubstituted aryl group having six to twelve ring-forming carbon atoms,
• R8 is a substituted or unsubstituted arylene group having six to twelve ring-forming carbon atoms, and
• n is an integer from one to three,
• R1-1 is a substituted or unsubstituted mercapto group, and
• R1-2 is a substituted or unsubstituted furanyl group.