Polymer compositions having photoacid generators and photoresists

A polymer composition comprising:

• 0.5 to 99 mol % of a hydroxystyrene repeat unit having the formula (A):
• 0.5 to 99 mol % of a sulfonated photoacid generator repeat unit having the formula (B):
• and
• 0.5 to 99 mol % of an acid labile repeat unit having the formula (C):
• wherein:
• each of R1, R2, and R3 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, a halogen atom, a cyano group or an alkoxycarbonyl group;
• R4 represents a hydrogen atom, an alkyl group, an alkoxy group, a halogen atom, or a cyano group, and m represents an integer in a range of from 1 to 4, wherein when m is 2 or more, each R4 independently represents a hydrogen atom, an alkyl group, an alkoxy group, a halogen atom, or a cyano group;
• each of Q1 and Q2 independently represents a hydrogen atom, a fluorine atom or a perfluoro alkyl group with 1 to 4 carbon atoms, and n represents an integer in a range of from 0 to 4, wherein when n is 2 or more, each Q1 and Q2 independently represents a hydrogen atom, a fluorine atom or a perfluoro alkyl group with 1 to 4 carbon atoms;
• L1 represents a single bond or a divalent saturated hydrocarbon group having from 1 to 20 carbon atoms, wherein one or more methylene groups in the divalent saturated hydrocarbon group is replaced by an oxygen, a sulfur, a carbonyl group, or a sulfonyl group;
• Z+ represents an organic cation;
• and
• G1 represents an organic group comprising an acid labile group, wherein the acid labile repeat unit having the formula (C) is derived from an acrylate having an acid-labile group in its side chain or a methacrylate having an acid-labile group in its side chain.