Photoacid generator, chemically amplified resist composition, and patterning process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsTomomi Watanabe, Takayuki Fujiwara, Koji Hasegawa
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Abstract
An onium salt consisting of an anion containing an iodized aromatic group and two sulfonate groups and a sulfonium or iodonium cation is a useful photoacid generator. A chemically amplified resist composition comprising the photoacid generator forms a pattern of rectangular profile with a good balance of sensitivity, CDU, LWR, MEF, and DOF when it is processed by photolithography using high-energy radiation.
Claims20
A photoacid generator in the form of an onium salt consisting of an anion containing an iodine-substituted aromatic group and two sulfonate groups and a sulfonium or iodonium cation.
Dependencies are inferred from the claim text.