Lactone-containing compounds, polymers, resist compositions, and patterning method
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsKoji Hasegawa, Tsunehiro Nishi, Takeshi Kinsho, Jun Hatakeyama, Osamu Watanabe
Life of this patent
Estimating the term…
Abstract
A novel lactone-containing compound is provided as well as a polymer comprising units of the compound. The polymer is used as a base resin to formulate a resist composition having a high sensitivity, resolution and etching resistance.
Claims21
A lactone-containing compound of the following formula (1):
- wherein R1 is hydrogen, methyl or CH2CO2R5, R2 is hydrogen, methyl or CO2R5, R3 is hydrogen or a straight, branched or cyclic alkyl group of 1 to 8 carbon atoms, R4 is hydrogen or CO2R5, R5 is a straight, branched or cyclic alkyl group of 1 to 15 carbon atoms, and X is CH2, CH2CH2, O or S.
A polymer comprising units of the following formula (1a) and having a weight average molecular weight of 1,000 to 500,000,
- wherein R1 is hydrogen, methyl or CH2CO2R5, R2 is hydrogen, methyl or CO2R5, R3 is hydrogen or a straight, branched or cyclic alkyl group of 1 to 8 carbon atoms, R4 is hydrogen or CO2R5, R5 is a straight, branched or cyclic alkyl group of 1 to 15 carbon atoms, and X is CH2, CH2CH2, O or S.
A method for preparing a polymer comprising effecting radical or anionic polymerization between a lactone-containing compound of the general formula (1) and another compound having a carbon-to-carbon double bond
- wherein R1 is hydrogen, methyl or CH2CO2R5, R2 is hydrogen, methyl or CO2R5,R3 is H or a straight, branched or cyclic alkyl group of 1 to 8 carbon atoms, R4 is hydrogen or CO2R5, R5 is a straight, branched or cyclic alkyl group of 1 to 15 carbon atoms, and X is CH2, C2CH2, O or S.
Dependencies are inferred from the claim text.