G03F 7/0048
Characterised by the solvents or agents facilitating spreading
Official title: {characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents}
G03F7/0048 (Characterised by the solvents or agents facilitating spreading) appears on 466 US grants and 721 published applications in this corpus.
Search patents in G03F- Granted patents
- 466
- Published applications
- 721
- Assignees
- 215
- Inventors
- 1,631
- Latest grant
- 29 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1984 | 1 | 0 |
| 1985 | 3 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 1 | 0 |
| 1989 | 3 | 0 |
| 1990 | 4 | 0 |
| 1991 | 3 | 0 |
| 1992 | 7 | 0 |
| 1993 | 6 | 0 |
| 1994 | 9 | 0 |
| 1995 | 8 | 0 |
| 1996 | 2 | 0 |
| 1997 | 3 | 0 |
| 1998 | 5 | 0 |
| 1999 | 7 | 0 |
| 2000 | 11 | 0 |
| 2001 | 6 | 2 |
| 2002 | 10 | 14 |
| 2003 | 9 | 14 |
| 2004 | 11 | 17 |
| 2005 | 8 | 20 |
| 2006 | 4 | 16 |
| 2007 | 11 | 20 |
| 2008 | 14 | 19 |
| 2009 | 9 | 14 |
| 2010 | 5 | 34 |
| 2011 | 9 | 21 |
| 2012 | 21 | 20 |
| 2013 | 16 | 11 |
| 2014 | 17 | 23 |
| 2015 | 27 | 21 |
| 2016 | 18 | 18 |
| 2017 | 17 | 25 |
| 2018 | 15 | 22 |
| 2019 | 19 | 48 |
| 2020 | 17 | 39 |
| 2021 | 24 | 29 |
| 2022 | 22 | 17 |
| 2023 | 20 | 64 |
| 2024 | 21 | 82 |
| 2025 | 21 | 70 |
| 2026 | 22 | 41 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Photosensitive resin composition and display device including the same29 Sep 2026US 12,748,349 B2Samsung Display Co., Ltd.
- Photosensitive resin composition, photosensitive resin film, photosensitive dry film, and pattern formation method29 Sep 2026US 12,748,350 B2Shin-Etsu Chemical Co., Ltd.
- Resist composition and method for using resist composition8 Sep 2026US 12,730,375 B2Mitsubishi Gas Chemical Company, Inc.
- UV-curable resin compositions suitable for redistribution layers25 Aug 2026US 12,717,232 B2Designer Molecules, Inc.
- Tin compound and resist solution using the same, pattern forming method, thin film, patterned thin film, and method for producing tin compound11 Aug 2026US 12,703,713 B2Gelest, Inc.
- Additives for organotin photoresist compositions and patterning of the same1 Oct 2026US 2026/0299407 A1
- Photoresist developer and methods of use1 Oct 2026US 2026/0299428 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Silicone-containing copolymer, leveling agent, coating composition, resist composition, color filter, and method for producing silicone-containing copolymer10 Sep 2026US 2026/0265437 A1DIC Corporation
- Liquid chemical and method for producing liquid chemical3 Sep 2026US 2026/0259503 A1FUJIFILM Corporation
- Radiation-sensitive resist composition and pattern formation method using the same27 Aug 2026US 2026/0251969 A1Samsung Electronics Co., Ltd.
Most cited
By later US patents
- Positive photoresist composition for far ultraviolet exposure66US 6,479,211 B1Fuji Photo Film Co., Ltd. · 2002
- Water-soluble resin composition66US 6,555,607 B1Clariant Finance (BVI) Limited · 2003
- Copolymers for photoresists and processes therefor63US 6,872,503 B2E. I. Du Pont de Nemours and Company · 2005
- Curable composition for imprint, pattern-forming method and pattern48US 8,933,144 B2FUJIFILM Corporation · 2015
- Process solutions containing surfactants45US 7,129,199 B2Air Products and Chemicals, Inc. · 2006