Positive photoresist composition for far ultraviolet exposure

A positive photoresist composition for far ultraviolet exposure, comprising:

• (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation, and
• (B′) a resin containing a repeating unit having an alkali-soluble group protected by at least one of the groups containing an alicyclic hydrocarbon structure represented by the following formula (pI), (pII), (pIII), (pIV), (pV) or (pVI) and repeating unit represented by the following formula (I) and being capable of decomposing under the action of an acid to increase the solubility in alkali:
• wherein in formulae (pI) and (pVI) R11 represents a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group or a sec-butyl group and Z represents an atomic group necessary for forming a unsubstituted or substituted alicyclic hydrocarbon group together with the carbon atom represented by the following formulae (1)-(39) and (41)-(50);
• wherein in formulae (pII)-(pV) R11 represents a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group or a sec-butyl group, Z represents an atomic group necessary for forming an alicyclic hydrocarbon group together with the carbon atom;
• R12 and R16 each independently represents a linear or branched alkyl group having from 1 to 4 carbon atoms or an alicyclic hydrocarbon group having from 1 to 4 carbon atoms, provided that at least one of R12 to R14 or either one of R15 and R16 represents an alicyclic hydrocarbon group;
• R17 and R21 each independently represents a hydrogen atom, a linear or branched alkyl group having from 1 to 4 carbon atoms or an alicyclic hydrocarbon group having from 1 to 4 carbon atoms, provided that at least one of R17 to R21 represents an alicyclic hydrocarbon group and that either one of R19 and R21 represents a linear or branched alkyl group having from 1 to 4 carbon atoms or an alicyclic hydrocarbon group having from 1 to 4 carbon atoms;
• and R22 to R25 each independently represents a linear or branched alkyl group having from 1 to 4 carbon atoms or an alicyclic hydrocarbon group having from 1 to 4 carbon atoms, provided that at least one of R22 to R25 represents an alicyclic hydrocarbon group;
• where R1 represents a hydrogen atom, a halogen atom, a linear or branched alkyl group having from 1 to 4 carbon atoms and R2 to R4 each independently represents a hydrogen atom or a hydroxyl group, provided that at least one of R2 to R4 represents a hydroxyl group.

A positive photoresist composition for far ultraviolet exposure, comprising:

• (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation, and
• (B″) a resin containing a repeating unit having a group represented by the following formula (I) and a repeating unit represented by the following formula (II′):
• wherein R1 represents a hydrogen atom, a halogen atom, a linear or branched alkyl group having from 1 to 4 carbon atoms and R2 to R4 each independently represents a hydrogen atom or a hydroxyl group, provided that at least one of R2 to R4 represents a hydroxyl group;
• wherein Ra′ represents a hydrogen atom or an alkyl group having from 1 to 4 carbon atoms, provided that when m′ is 0 or 2, Ra′ represents an alkyl group having from 1 to 4 carbon atoms;
• Rb′ to Re′ each independently represent a hydrogen atom or an alkyl group which may have a substituent;
• m′ represents an integer of from 0 to 2;
• and n′ represents an integer of from 1 to 3, provided that m′+n′ is a number of from 2 to 6.

A positive photoresist composition for far ultraviolet exposure, comprising:

• (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation,
• (B) a resin having a repeating unit represented by the following formula (I) and being capable of decomposing under the action of an acid to increase the solubility in alkali, and
• (C) a compound represented by the following formula (CI) or (CII):
• wherein R1 represents a hydrogen atom, a halogen atom, a linear or branched alkyl group having from 1 to 4 carbon atoms and R2 to R4 each independently represents a hydrogen atom or a hydroxyl group, provided that at least one of R2 to R4 represents a hydroxyl group;
• wherein
• in formula (CI), Xc represents —O—, —S—, —N(R53)— or a single bond, R51, R52 and R53 each independently represents a hydrogen atom or an alkyl group, Rc′ represents a group for constituting an acid decomposable group in the form of —COORc′, and Rc represents an n1-valent residue containing a bridge-containing hydrocarbon group or a naphthalene ring;
• and
• in formula (CII), R60 represents a hydrogen atom or an alkyl group, R61 represents a group for constituting an acid decomposable group in the form of —O—R61, m1, n1 and p1 each independently represents an integer of from 1 to 4, and q1 represents an integer of from 0 to 10.

A positive photoresist composition for far ultraviolet exposure, comprising:

• (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation,
• (B) a resin having a repeating unit represented by the following formula (I) and being capable of decomposing under the action of an acid to increase the solubility in alkali, and
• (E) a compound capable of decomposing under the action of an acid to generate a sulfonic acid:
• wherein R1 represents a hydrogen atom, a halogen atom, a linear or branched alkyl group having from 1 to 4 carbon atoms and R2 to R4 each independently represents a hydrogen atom or a hydroxyl group, provided that at least one of R2 to R4 represents a hydroxyl group.

A positive photoresist composition for far ultraviolet exposure, comprising:

• (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation,
• (B) a resin having a repeating unit represented by the following formula (I) and being capable of decomposing under the action of an acid to increase the solubility in alkali, and
• (S1) a solvent containing (a) ethyl lactate in an amount of from 60 to 90 wt % based on the entire solvent and (b) ethyl 3-ethoxypropionate in an amount of from 10 to 40 wt % based on the entire solvent:
• wherein R1 represents a hydrogen atom, a halogen atom, a linear or branched alkyl group having from 1 to 4 carbon atoms and R2 to R4 each independently represents a hydrogen atom or a hydroxyl group, provided that at least one of R2 to R4 represents a hydroxyl group.

A positive photoresist composition for far ultraviolet exposure, comprising:

• (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation,
• (B) a resin having a repeating unit represented by the following formula (I) and being capable of decomposing under the action of an acid to increase the solubility in alkali, and
• (S2) a solvent containing (a) a first solvent shown below in an amount of from 60 to 90 wt % based on the entire solvent and (b) a second solvent shown below in an amount of from 10 to 40 wt % based on the entire solvent:
• (a) at least one first solvent selected from ethyl lactate, propylene glycol monomethyl ether acetate, propylene glycol monomethyl ether propionate, methyl 3-methoxypropionate, ethyl 3-ethoxypropionate and 2-heptanone;
• and
• (b) a second solvent having a viscosity at a temperature of 20° C. of 1 cps or less:
• wherein R1 represents a hydrogen atom, a halogen atom, a linear or branched alkyl group having from 1 to 4 carbon atoms and R2 to R4 each independently represents a hydrogen atom or a hydroxyl group, provided that at least one of R2 to R4 represents a hydroxyl group.