Liquid chemical and method for producing liquid chemical
AssigneeFUJIFILM Corporation
InventorTetsuya KAMIMURA
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Abstract
An object of the present invention is to provide a liquid chemical exhibiting excellent defect inhibitive performance even in a case of being applied to a resist process by EUV exposure. Another object thereof is to provide a method for producing a liquid chemical. The liquid chemical of the present invention includes an organic solvent, and metal-containing particles containing a metal atom, in which the number of metal nanoparticles contained in the metal-containing particles and having a particle size of 0.5 to 17 nm is 1.0×101 to 1.0×109 particles/cm3, based on the number of the particles per unit volume of the liquid chemical.
Claims13
A resist composition comprising:
- a liquid chemical,
- wherein the liquid chemical comprises
- an organic solvent;
- and
- metal-containing particles containing a metal atom, and
- the number of metal nanoparticles contained in the metal-containing particles and having a particle size of 0.5 to 17 nm is 1.0×101 to 1.0×109 particles/cm3, based on the number of the particles per unit volume of the liquid chemical.
Dependencies are inferred from the claim text.