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US 12,730,375 B2Granted
Resist composition and method for using resist composition
AssigneeMitsubishi Gas Chemical Company, Inc.
InventorsTakumi Okada, Hideyuki Sato, Masayuki Katagiri, Shu Suzuki
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Abstract
Provided is a resist composition which contains a resin (A) and a solvent (B) that contains a compound (B1) represented by general formula (b-1), wherein the content of the active ingredients based on the total amount of the resist composition is 45% by mass or less. (In formula (b-1), R1 represents an alkyl group having from 1 to 10 carbon atoms.)
Claims3
A resist composition consisting of a resin (A), a solvent (B), and a photosensitizing agent (C),
- wherein the resin (A) consists of a novolac-type resin (A1), and
- the solvent (B) consists of a compound (B1) represented by general formula (b-1), wherein a content of the resin (A) and the photosensitizing agent (C) based on the total amount of the resist composition is 45% by mass or less:
- wherein in formula (b-1), R1 is an n-propyl group, an i-propyl group, an n-butyl group, an i-butyl group, an s-butyl group, or a t-butyl group.
A resist composition consisting of a resin (A) and a solvent (B),
- wherein the solvent (B) consists of a compound (B1) represented by general formula (b-1), and
- the resin (A) is
- a resin (A2) which has at least one of a structural unit (a2-1) derived from a phenolic hydroxyl group-containing compound and a structural unit (a2-2) that may be decomposed by the action of an acid to form an acidic functional group;
- wherein a content of resin (A) based on the total amount of the resist composition is 45% by mass or less:
- wherein in formula (b-1), R1 is an n-propyl group, an i-propyl group, an n-butyl group, an i-butyl group, an s-butyl group, or a t-butyl group.
2 more elements
Dependencies are inferred from the claim text.