G03F 7/0042
With inorganic or organometallic light-sensitive compounds not otherwise provided for
Official title: {with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists (G03F7/075 takes precedence)}
G03F7/0042 (With inorganic or organometallic light-sensitive compounds not otherwise provided for) appears on 719 US grants and 1,282 published applications in this corpus.
Search patents in G03F- Granted patents
- 719
- Published applications
- 1,282
- Assignees
- 308
- Inventors
- 2,086
- Latest grant
- 29 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 3 | 0 |
| 1977 | 1 | 0 |
| 1978 | 3 | 0 |
| 1979 | 2 | 0 |
| 1980 | 0 | 0 |
| 1981 | 2 | 0 |
| 1982 | 6 | 0 |
| 1983 | 3 | 0 |
| 1984 | 3 | 0 |
| 1985 | 4 | 0 |
| 1986 | 0 | 0 |
| 1987 | 1 | 0 |
| 1988 | 1 | 0 |
| 1989 | 3 | 0 |
| 1990 | 2 | 0 |
| 1991 | 7 | 0 |
| 1992 | 1 | 0 |
| 1993 | 5 | 0 |
| 1994 | 3 | 0 |
| 1995 | 2 | 0 |
| 1996 | 2 | 0 |
| 1997 | 5 | 0 |
| 1998 | 7 | 0 |
| 1999 | 8 | 0 |
| 2000 | 7 | 0 |
| 2001 | 9 | 0 |
| 2002 | 7 | 9 |
| 2003 | 8 | 9 |
| 2004 | 6 | 15 |
| 2005 | 7 | 15 |
| 2006 | 11 | 16 |
| 2007 | 7 | 10 |
| 2008 | 5 | 26 |
| 2009 | 7 | 21 |
| 2010 | 6 | 14 |
| 2011 | 9 | 11 |
| 2012 | 16 | 13 |
| 2013 | 13 | 18 |
| 2014 | 14 | 20 |
| 2015 | 18 | 23 |
| 2016 | 21 | 14 |
| 2017 | 13 | 41 |
| 2018 | 20 | 43 |
| 2019 | 25 | 65 |
| 2020 | 46 | 68 |
| 2021 | 39 | 83 |
| 2022 | 50 | 95 |
| 2023 | 59 | 132 |
| 2024 | 76 | 160 |
| 2025 | 84 | 216 |
| 2026 | 62 | 145 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Semiconductor photoresist composition and method of forming patterns using the composition29 Sep 2026US 12,748,348 B2Samsung SDI.Co., Ltd.
- Apparatus and process for EUV dry resist sensitization by gas phase infusion of a sensitizer15 Sep 2026US 12,736,874 B2Lam Research Corporation
- Providing a barrier layer for photoresist processing15 Sep 2026US 12,736,881 B2Tokyo Electron Limited
- Photosensitive composition8 Sep 2026US 12,730,376 B2Tokyo Ohka Kogyo.Co., Ltd.
- Photoresist underlayer and method of manufacturing a semiconductor device8 Sep 2026US 12,730,378 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Gas-based development of organometallic resist in an oxidizing halogen-donating environment8 Oct 2026US 2026/0310073 A1Inpria Corporation
- Resist composition and patterning process8 Oct 2026US 2026/0310074 A1Shin-Etsu Chemical Co., Ltd.
- Photosensitive resin composition, cured substance, laminate, manufacturing method for cured substance, manufacturing method for laminate, manufacturing method for semiconductor device, semiconductor device, polyimide, manufacturing method for polyimide, and compound8 Oct 2026US 2026/0310076 A1FUJIFILM Corporation
- High chi block copolymer (bcp) pattern on latent extreme ultraviolet (euv) images8 Oct 2026US 2026/0310085 A1APPLIED Materials.Inc.
- Magnetic annealing of metal oxide based resists8 Oct 2026US 2026/0310086 A1APPLIED Materials.Inc.
Most cited
By later US patents
- Organometallic solution based high resolution patterning compositions475US 9,310,684 B2Inpria Corporation · 2016
- Lithography patterning with a gas phase resist422US 10,018,920 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2018
- EUV photopatterning of vapor-deposited metal oxide-containing hardmasks405US 9,996,004 B2Lam Research Corporation · 2018
- Vacuum-integrated hardmask processes and apparatus389US 9,778,561 B2Lam Research Corporation · 2017
- High resolution, multi-layer resist for microlithography and method therefor261US 5,314,772 AArizona Board of Regents · 1994