Semiconductor photoresist composition and method of forming patterns using the composition

A semiconductor photoresist composition, comprising:

• an organometallic compound represented by Chemical Formula 1 and a solvent:
• [R1L1SnO(R2L2C(═O)O)]6 Chemical Formula 1
• wherein, in Chemical Formula 1,
• R1 is a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, a substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted C2 to C20 alkenyl group, a substituted or unsubstituted C2 to C20 alkynyl group, a substituted or unsubstituted C6 to C30 aryl group, a substituted or unsubstituted C7 to C31 arylalkyl group or a combination thereof,
• R2 is a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, a substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted C2 to C20 alkenyl group, a substituted or unsubstituted C2 to C20 alkynyl group, or a combination thereof, and
• L1 and L2 are each independently a single bond or a substituted or unsubstituted C1 to C10 alkylene group,
• wherein:
• in R2, the substituted C1 to C20 alkyl group, the substituted C1 to C20 alkoxy group, the substituted C3 to C20 cycloalkyl group, the substituted C2 to C20 alkenyl group, or the substituted C2 to C20 alkynyl group, has at least one hydrogen atom is replaced by at least one of a hydroxy group, —NRR′, a sulfonyl group, a thiol group, a ketone group, an aldehyde group, a C1 to C20 alkoxy group, or a combination thereof, and
• wherein, R and R′ are each independently hydrogen, a substituted or unsubstituted C1 to C30 saturated or unsaturated aliphatic hydrocarbon group, a substituted or unsubstituted C3 to C30 saturated or unsaturated alicyclic hydrocarbon group, or a substituted or unsubstituted C6 to C30 aromatic hydrocarbon group.