G03F 7/0043
Chalcogenides
Official title: {Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof (G03F7/0044 takes precedence)}
G03F7/0043 (Chalcogenides) appears on 366 US grants and 604 published applications in this corpus.
Search patents in G03F- Granted patents
- 366
- Published applications
- 604
- Assignees
- 185
- Inventors
- 1,200
- Latest grant
- 15 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 3 | 0 |
| 1977 | 0 | 0 |
| 1978 | 0 | 0 |
| 1979 | 1 | 0 |
| 1980 | 0 | 0 |
| 1981 | 1 | 0 |
| 1982 | 2 | 0 |
| 1983 | 1 | 0 |
| 1984 | 3 | 0 |
| 1985 | 2 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 1 | 0 |
| 1989 | 3 | 0 |
| 1990 | 1 | 0 |
| 1991 | 2 | 0 |
| 1992 | 0 | 0 |
| 1993 | 2 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 1 | 0 |
| 1997 | 1 | 0 |
| 1998 | 0 | 0 |
| 1999 | 2 | 0 |
| 2000 | 2 | 0 |
| 2001 | 2 | 0 |
| 2002 | 2 | 5 |
| 2003 | 2 | 5 |
| 2004 | 4 | 8 |
| 2005 | 7 | 11 |
| 2006 | 7 | 9 |
| 2007 | 4 | 6 |
| 2008 | 4 | 23 |
| 2009 | 5 | 13 |
| 2010 | 6 | 9 |
| 2011 | 7 | 8 |
| 2012 | 9 | 9 |
| 2013 | 7 | 11 |
| 2014 | 12 | 12 |
| 2015 | 10 | 15 |
| 2016 | 15 | 13 |
| 2017 | 9 | 20 |
| 2018 | 12 | 30 |
| 2019 | 16 | 39 |
| 2020 | 28 | 31 |
| 2021 | 21 | 35 |
| 2022 | 27 | 44 |
| 2023 | 27 | 54 |
| 2024 | 28 | 55 |
| 2025 | 43 | 75 |
| 2026 | 24 | 64 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Providing a barrier layer for photoresist processing15 Sep 2026US 12,736,881 B2Tokyo Electron Limited
- Underlayer compound for photolithography, multilayered structure formed using the same, and method for manufacturing semiconductor devices using the same1 Sep 2026US 12,724,346 B2Inha University Research and Business Foundation
- Methods and materials for metallic photoresist25 Aug 2026US 12,717,229 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Generation of multiline etch substrates25 Aug 2026US 12,721,060 B2Geminatio, Inc.
- Photoresist composition and method of manufacturing a semiconductor device4 Aug 2026US 12,699,320 B2Taiwan Semiconductor Manufacturing Company.Ltd
- High chi block copolymer (bcp) pattern on latent extreme ultraviolet (euv) images8 Oct 2026US 2026/0310085 A1APPLIED Materials.Inc.
- Magnetic annealing of metal oxide based resists8 Oct 2026US 2026/0310086 A1APPLIED Materials.Inc.
- Semiconductor method of manufacture and layer composition1 Oct 2026US 2026/0299424 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Method for manufacturing semiconductor used resist with magnetic materials in line/space pattern1 Oct 2026US 2026/0299427 A1Nanya Technology Corporation
- Positive resist for dry development, method for manufacturing semiconductor devices using the same and multilayered structure formed using the same24 Sep 2026US 2026/0288000 A1Inha University Research and Business Foundation
Most cited
By later US patents
- Organometallic solution based high resolution patterning compositions475US 9,310,684 B2Inpria Corporation · 2016
- EUV photopatterning of vapor-deposited metal oxide-containing hardmasks405US 9,996,004 B2Lam Research Corporation · 2018
- Vacuum-integrated hardmask processes and apparatus389US 9,778,561 B2Lam Research Corporation · 2017
- Ion beam exposure of (g-Ge.sub.x -Se.sub.1-x) inorganic resists196US 4,405,710 ACornell Research Foundation, Inc. · 1983
- Gray scale mask and depth pattern transfer technique using inorganic chalcogenide glass190US 5,998,066 AAerial Imaging Corporation · 1999