Gray scale mask and depth pattern transfer technique using inorganic chalcogenide glass
AssigneeAerial Imaging Corporation
InventorsBarry Block, Arnold O. Thornton
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AssigneeAerial Imaging Corporation
InventorsBarry Block, Arnold O. Thornton
Estimating the term…
A method of producing a high resolution expanded analog gray scale mask is described. Using an inorganic chalcogenide glass, such as a selenium germanium, coated with a thin layer of silver, a gray scale mask may be produced with accurate control of the size, uniformity and variance of the pixels. The selenium germanium glass is composed of column structures arranged perpendicularly to the substrate giving a possible edge precision of 100 .ANG.. The column structures also prevent undercutting during the etching process, thus permitting pixels to be placed close together. Accordingly, selenium germanium may be used as a high resolution gray scale mask with an expanded analog gray scale. The gray scale mask may be used to impress information as a modulated thickness on a selenium germanium photoresist film on an inorganic substrate. The selenium germanium photoresist film may then transfer the gray scale to the substrate.
A method comprising:
A method comprising:
Method comprising the steps of:
Method for using a gray scale mask, said gray scale mask comprising a thickness modulated chalcogenide glass layer, said method comprising irradiating a resist layer through said thickness modulated chalcogenide glass layer to thereby transfer the thickness pattern in said chalcogenide glass layer to said resist layer.
Method for using a gray scale mask, said gray scale mask comprising a chalcogenide layer in which portions of said chalcogenide layer have been selectively removed, said method comprising the step of irradiating a resist layer through said chalcogenide layer to thereby transfer gray scale information in said chalcogenide layer to said resist layer.
Dependencies are inferred from the claim text.